Tantalum(V) 2,2,2-trifluoroethoxide is a chemical compound that combines tantalum with trifluoroethoxide. It is recognized for its high thermal stability and is utilized as a precursor in the synthesis of tantalum oxide thin films. TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE is particularly valued for its applications in the semiconductor and electronics industries, where its corrosion-resistant properties are advantageous in high-temperature and harsh chemical environments.
13053-54-8
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Basic information
- Product Name: TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE
- Synonyms: TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE;TANTALUM V TRIFLUOROETHOXIDE;TANTALUM TRIFLUOROETHOXIDE;TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE, 99.99+% (METALS BASIS)
- CAS NO:13053-54-8
- Molecular Formula: C10H10F15O5Ta
- Molecular Weight: 676.11
- EINECS: N/A
- Product Categories: N/A
- Mol File: 13053-54-8.mol
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Chemical Properties
- Melting Point: N/A
- Boiling Point: 70°C 2mm
- Flash Point: 115°C/0.1mm
- Appearance: /
- Density: 1,9 g/cm3
- Refractive Index: N/A
- Storage Temp.: N/A
- Solubility: N/A
- Sensitive: Moisture Sensitive
- CAS DataBase Reference: TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE(CAS DataBase Reference)
- NIST Chemistry Reference: TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE(13053-54-8)
- EPA Substance Registry System: TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE(13053-54-8)
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Safety Data
- Hazard Codes: N/A
- Statements: 20/21/22-36/37/38
- Safety Statements: 23-26-36/37/39
- RIDADR: UN1760
- WGK Germany:
- RTECS:
- TSCA: No
- HazardClass: 8
- PackingGroup: III
- Hazardous Substances Data: 13053-54-8(Hazardous Substances Data)
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13053-54-8 Usage
Uses
Used in Electronics Industry:Tantalum(V) 2,2,2-trifluoroethoxide is used as a precursor for the production of tantalum oxide thin films, which are integral to the manufacturing of thin film capacitors. These capacitors are essential components in various electronic devices due to their ability to store electrical energy.
Used in Semiconductor Industry:
In the semiconductor industry, Tantalum(V) 2,2,2-trifluoroethoxide serves as a crucial material for creating thin films that are used in the fabrication of integrated circuits and other microelectronic components. The high thermal stability of the compound ensures reliable performance in the demanding conditions of semiconductor manufacturing.
Used as a Protective Coating:
Tantalum(V) 2,2,2-trifluoroethoxide is also used in the synthesis of tantalum oxide thin films that provide protective coatings for various materials. The corrosion-resistant nature of tantalum makes these coatings highly effective in shielding materials from harsh chemical environments and extreme temperatures.
Overall, Tantalum(V) 2,2,2-trifluoroethoxide plays a significant role in the advancement of technology and industry, particularly in the areas of electronics and semiconductors, where its unique properties are harnessed to improve the performance and reliability of devices and components.
Check Digit Verification of cas no
The CAS Registry Mumber 13053-54-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,0,5 and 3 respectively; the second part has 2 digits, 5 and 4 respectively.Calculate Digit Verification of CAS Registry Number 13053-54:
(7*1)+(6*3)+(5*0)+(4*5)+(3*3)+(2*5)+(1*4)=68
68 % 10 = 8
So 13053-54-8 is a valid CAS Registry Number.
InChI:InChI=1/5C2H2F3O.Ta/c5*3-2(4,5)1-6;/h5*1H2;/q5*-1;+5
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TANTALUM(V) 2,2,2-TRIFLUOROETHOXIDE
