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13170-23-5

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13170-23-5 Usage

Uses

Di-t-butoxydiacetoxy silane (DBAC) is used as a raw material for acetoxy crosslinking RTV-1 sealants.

Chemical Properties

Colorless or yellowish transparent liquid

Flammability and Explosibility

Notclassified

Check Digit Verification of cas no

The CAS Registry Mumber 13170-23-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,1,7 and 0 respectively; the second part has 2 digits, 2 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 13170-23:
(7*1)+(6*3)+(5*1)+(4*7)+(3*0)+(2*2)+(1*3)=65
65 % 10 = 5
So 13170-23-5 is a valid CAS Registry Number.
InChI:InChI=1/C12H24O6Si/c1-9(13)15-19(16-10(2)14,17-11(3,4)5)18-12(6,7)8/h1-8H3

13170-23-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name DI-T-BUTOXYDIACETOXYSILANE

1.2 Other means of identification

Product number -
Other names Diacetoxy-di-tert-butoxy-silan

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:13170-23-5 SDS

13170-23-5Synthetic route

di-t-butoxydichlorosilane
18395-80-7

di-t-butoxydichlorosilane

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

Conditions
ConditionsYield
With pyridine; acetic acid76%
With pyridine; sodium acetate76%
With NaCH3COO; pyridine76%
With CH3COOH; pyridine76%
di-t-butoxydichlorosilane
18395-80-7

di-t-butoxydichlorosilane

acetic acid
64-19-7

acetic acid

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

Conditions
ConditionsYield
With pyridine
tert-butyl alcohol
75-65-0

tert-butyl alcohol

tetraacetoxysilane
562-90-3

tetraacetoxysilane

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

ethanol
64-17-5

ethanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H26O5Si

C12H26O5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere;95%
Iodoethanol
624-76-0

Iodoethanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H25IO5Si

C12H25IO5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere;93%
di-t-butoxydichlorosilane
18395-80-7

di-t-butoxydichlorosilane

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

Conditions
ConditionsYield
With pyridine; acetic acid76%
With pyridine; sodium acetate76%
With NaCH3COO; pyridine76%
With CH3COOH; pyridine76%
di-t-butoxydichlorosilane
18395-80-7

di-t-butoxydichlorosilane

acetic acid
64-19-7

acetic acid

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

Conditions
ConditionsYield
With pyridine
tert-butyl alcohol
75-65-0

tert-butyl alcohol

tetraacetoxysilane
562-90-3

tetraacetoxysilane

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

ethanol
64-17-5

ethanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H26O5Si

C12H26O5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere;95%
Iodoethanol
624-76-0

Iodoethanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H25IO5Si

C12H25IO5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere;93%
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

isopropyl alcohol
67-63-0

isopropyl alcohol

C13H28O5Si

C13H28O5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 48h; Schlenk technique; Glovebox; Inert atmosphere;92%
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

(R)-(+)-1-iodobutan-2-ol

(R)-(+)-1-iodobutan-2-ol

C14H29IO5Si

C14H29IO5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere;91%
methanol
67-56-1

methanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C11H24O5Si

C11H24O5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 16h; Schlenk technique; Glovebox; Inert atmosphere;91%
(rac)-1-iodo-2-butanol
124780-92-3

(rac)-1-iodo-2-butanol

di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C14H29IO5Si

C14H29IO5Si

Conditions
ConditionsYield
In tetrahydrofuran at 20℃; for 72h; Schlenk technique; Glovebox; Inert atmosphere;90%
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

Conditions
ConditionsYield
Irradiation (UV/VIS); film formation by pulsed laser deposition at 248 nm on quartz substrate;
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

di-t-butoxymethoxysilanol
171365-52-9

di-t-butoxymethoxysilanol

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 16 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 1 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C10H24O4Si

C10H24O4Si

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 48 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 2 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C10H23IO4Si

C10H23IO4Si

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

bis(tert-butoxy)(iso-propoxy)silanol
889448-03-7

bis(tert-butoxy)(iso-propoxy)silanol

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 48 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 6 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H27IO4Si

C12H27IO4Si

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C12H27IO4Si

C12H27IO4Si

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C16H35N2O4Si(1+)*I(1-)

C16H35N2O4Si(1+)*I(1-)

Conditions
ConditionsYield
Multi-step reaction with 3 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
3: toluene / 3 h / 100 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C18H39N2O4Si(1+)*I(1-)

C18H39N2O4Si(1+)*I(1-)

Conditions
ConditionsYield
Multi-step reaction with 3 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
3: toluene / 24 h / 100 °C
View Scheme
di-t-butoxydiacetoxysilane
13170-23-5

di-t-butoxydiacetoxysilane

C18H39N2O4Si(1+)*I(1-)

C18H39N2O4Si(1+)*I(1-)

Conditions
ConditionsYield
Multi-step reaction with 3 steps
1: tetrahydrofuran / 72 h / 20 °C / Schlenk technique; Glovebox; Inert atmosphere
2: ammonium hydroxide / water / 4 h / 20 °C
3: toluene / 24 h / 100 °C
View Scheme

13170-23-5Downstream Products

13170-23-5Relevant articles and documents

Preparation of acyloxyalkoxysilanes

-

, (2008/06/13)

A process for preparing a silane of the formula I where R1 is --O--Y, n is an integer from 1 to 3, R2 is STR1 m is an integer from 1 to 3 and n+m=4, and Y and Z are each, independently of one another, unsubstituted or mono- or polyhalo-substituted C1 --C20 -alkyl, C2 --C20 -alkenyl, C2 --C20 -alkynyl and --(CH2)p --A, where p is an integer from 0 to 6 and A, which is unsubstituted or substituted by one or more C1 -C6 -alkyls, is a 3- to 20-membered hydrocarbon ring entails reacting a halosilicon compound of the formula II where X is fluorine, chlorine, bromine and iodine, with compounds of the formula III and IV, or with an anhydride of the formula V and the compound of the formula IV STR2 where R1 and R2, and Z have the above meanings, M is a metal of main group one and two.

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