13428-80-3 Usage
Uses
Used in Refractory Coatings:
Hafnium ethoxide is used as a precursor for the preparation of refractory coatings, which are essential in high-temperature applications such as aerospace and automotive industries. These coatings provide excellent thermal stability, corrosion resistance, and wear resistance.
Used in Nano-materials & Thin Films:
In the field of nano-materials and thin films, hafnium ethoxide is utilized as a starting material for the synthesis of hafnium-based nanostructures and thin films. These materials exhibit unique properties, such as high dielectric constants and excellent thermal stability, making them suitable for applications in microelectronics and optoelectronics.
Used in Display & Imaging:
Hafnium ethoxide is employed in the development of advanced display and imaging technologies. The high refractive index and optical transparency of hafnium-based materials make them ideal for use in components such as lenses, mirrors, and optical coatings.
Used in Catalysis & Synthesis:
As a catalyst or catalyst precursor, hafnium ethoxide plays a crucial role in various chemical reactions, including hydrogenation, oxidation, and polymerization processes. Its unique electronic and structural properties enable it to enhance the efficiency and selectivity of these reactions.
Used in Hybrid & Disperse Materials:
Hafnium ethoxide is also used in the synthesis of hybrid and disperse materials, which combine the properties of organic and inorganic components. These materials have potential applications in areas such as energy storage, environmental remediation, and advanced materials for various industries.
Check Digit Verification of cas no
The CAS Registry Mumber 13428-80-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,4,2 and 8 respectively; the second part has 2 digits, 8 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 13428-80:
(7*1)+(6*3)+(5*4)+(4*2)+(3*8)+(2*8)+(1*0)=93
93 % 10 = 3
So 13428-80-3 is a valid CAS Registry Number.
InChI:InChI=1/4C2H5O.Hf/c4*1-2-3;/h4*2H2,1H3;/q4*-1;+4
13428-80-3Relevant articles and documents
The alkoxides of zirconium and hafnium: direct electrochemical synthesis and mass-spectral study. Do ''M(OR)4'', where M = Zr, Hf, Sn really exist?
Turevskaya, E. P.,Kozlova, N. I.,Turova, N. Ya.,Belokon, A. I.,Berdyev, D. V.,et al.
, p. 734 - 742 (1995)
The direct electrochemical synthesis of zirconium (1a) and hafnium (1b) alkoxides, M(OPri)4*PriOH, Zr(OBui)4'BuiOH (4a) and M(OR)4, where R = Et (2a,b), n-Bu (3a), s-Bu (5a), C2H4OMe (6a,b) has been carried out by anodic oxidation of metals in anhydrous alcohols in the presence of LiCl as a conductive additive to give quantitative yields.The solubility polytherms and dissociation pressure of 1a,b have been investigated.It has been proved by means of chemical analysis, X-ray powder, and IR spectral studies that the desolvation of 1a,b and Sn(OPri)4*PriOH (1c) is accompanied by the formation of amorphous oxocompounds M3O(OPri)10.On the basis of 1H NMR data it has been proved that the structure of the latter is analogous to that of known triangular cluster molecules M3(μ3-O)(μ3-OR)(OR)6, where M = Mo, W, U.Mass-spectral data and the determined physicochemical characteristics of 1-5 permit to conclude that the samples of composition M(OR)4, where M = Zr, Hf, and 2, 3, 5 contain tri- and tetranuclear oxocomplexes M3O(OR)10 and M4O(OR)14 respectively, along with Zr(OR)4 oligomers of different molecular complexity. - Key words: oxoalkoxides, zirconium and hafnium alkoxides, electrochemical synthesis, mass-spectra, IR-, NMR-spectral, X-ray powder analysis.
