1357467-32-3Relevant academic research and scientific papers
SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION
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Paragraph 0290-0293, (2021/05/21)
The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represente
PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION
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Paragraph 0241-0244, (2019/06/29)
PROBLEM TO BE SOLVED: To provide a photoacid generator containing a new sulfonium salt having high photosensitivity to i-line. SOLUTION: A photoacid generator contains a mixed sulfonium salt of a sulfonium salt represented by the following formula (1) and a sulfonium salt represented by the following formula (2), or a sulfonium salt represented by the following formula (2). [R1-R15 are an alkyl group or the like; m1-m9 is an integer of 0-5; X- is a monovalent polyatomic anion]. SELECTED DRAWING: None COPYRIGHT: (C)2019,JPOandINPIT
SULFONIUM SALT, PHOTO-ACID GENERATOR, AND PHOTOSENSITIVE RESIN COMPOSITION
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Page/Page column 33, (2012/01/11)
There is provided a sulfonium salt having high photosensitivity to the i--line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl gro
