Hafnium tribromide, with the chemical formula HfBr3, is a chemical compound consisting of hafnium and bromine atoms. It is a solid material that can be found in both crystalline and amorphous forms, depending on the synthesis method. Known for its high melting point and excellent thermal stability, hafnium tribromide is a promising material for various applications.
13782-96-2
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Basic information
- Product Name: hafnium tribromide
- Synonyms: hafnium tribromide
- CAS NO:13782-96-2
- Molecular Formula:
- Molecular Weight: 418.202
- EINECS: N/A
- Product Categories: N/A
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Chemical Properties
- Melting Point: N/A
- Boiling Point: N/A
- Flash Point: N/A
- Appearance: N/A
- Density: N/A
- Refractive Index: N/A
- Storage Temp.: N/A
- Solubility: N/A
- CAS DataBase Reference: hafnium tribromide(CAS DataBase Reference)
- NIST Chemistry Reference: hafnium tribromide(13782-96-2)
- EPA Substance Registry System: hafnium tribromide(13782-96-2)
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Safety Data
- Hazard Codes: N/A
- Statements: N/A
- Safety Statements: N/A
- WGK Germany:
- RTECS:
- HazardClass: N/A
- PackingGroup: N/A
- Hazardous Substances Data: 13782-96-2(Hazardous Substances Data)
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13782-96-2 Usage
Uses
Used in High-Temperature Protective Coatings:Hafnium tribromide is used as a protective coating for materials exposed to high temperatures due to its high melting point and excellent thermal stability. This application helps to prevent damage and degradation of materials under extreme thermal conditions.
Used in Organic Synthesis as a Catalyst:
Hafnium tribromide is used as a catalyst in organic synthesis, facilitating various chemical reactions and improving the efficiency of the synthesis process. Its unique properties make it a valuable component in the development of new chemical compounds and materials.
Used in Semiconductor Industry for Thin Film Deposition:
In the semiconductor industry, hafnium tribromide is used as a precursor for the deposition of hafnium-containing thin films. These films are essential for the fabrication of integrated circuits and other semiconductor devices, enhancing their performance and reliability.
Used in Research and Development:
Hafnium tribromide is also used in research and development for exploring its potential applications in various fields. Its unique properties and versatility make it an interesting subject for scientific investigation and innovation.
Overall, hafnium tribromide is a versatile chemical compound with a wide range of applications, from high-temperature protective coatings to catalysts in organic synthesis and thin film deposition in the semiconductor industry. Its relatively safe handling and lack of significant health hazards make it an attractive material for further exploration and utilization.
Check Digit Verification of cas no
The CAS Registry Mumber 13782-96-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,7,8 and 2 respectively; the second part has 2 digits, 9 and 6 respectively.Calculate Digit Verification of CAS Registry Number 13782-96:
(7*1)+(6*3)+(5*7)+(4*8)+(3*2)+(2*9)+(1*6)=122
122 % 10 = 2
So 13782-96-2 is a valid CAS Registry Number.
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