1408321-85-6Relevant academic research and scientific papers
Design and synthesis of a photoaromatization-based two-stage photobase generator for pitch division lithography
Hagiwara, Yuji,Mesch, Ryan A.,Kawakami, Takanori,Okazaki, Masahiro,Jockusch, Steffen,Li, Yongjun,Turro, Nicholas J.,Grant Willson
, p. 1730 - 1734 (2013/03/29)
The synthesis of a two-stage photobase generator (PBG) based on photoinduced aromatization is described. This material was designed for use in resolution-enhanced photolithography. Computer modeling predicts that a delay in the onset of base generation ca
Study of a two-stage photobase generator for photolithography in microelectronics
Turro, Nicholas J.,Li, Yongjun,Jockusch, Steffen,Hagiwara, Yuji,Okazaki, Masahiro,Mesch, Ryan A.,Schuster, David I.,Willson, C. Grant
supporting information, p. 1735 - 1741 (2013/03/29)
The investigation of the photochemistry of a two-stage photobase generator (PBG) is described. Absorption of a photon by a latent PBG (1) (first step) produces a PBG (2). Irradiation of 2 in the presence of water produces a base (second step). This two-photon sequence (1 + hν → 2 + hν → base) is an important component in the design of photoresists for pitch division technology, a method that doubles the resolution of projection photolithography for the production of microelectronic chips. In the present system, the excitation of 1 results in a Norrish type II intramolecular hydrogen abstraction to generate a 1,4-biradiacal that undergoes cleavage to form 2 and acetophenone (Φ ～ 0.04). In the second step, excitation of 2 causes cleavage of the oxime ester (Φ = 0.56) followed by base generation after reaction with water.
