141248-49-9Relevant academic research and scientific papers
Associative and dissociative electron attachment by SF6 and SF5Cl
Fenzlaff, Marita,Gerhard, Rolf,Illenberger, Eugen
, p. 149 - 155 (1988)
Electron attachment by SF6 and SF5Cl in the energy range 0-20 eV has been studied in a beam experiment at room temperature.At low energies ( ca. 0 eV) electron attachment to SF6 yields the well known parent anion SF6-* (associative attachment) and SF5- (dissociative attachment), while other negative ion fragments (F-, F2-, SF2-, SF3-, and SF4-) are generated with comparably low cross sections from various resonances at higher energies.In contrast to that, negative ion formation in SF5Cl is dominated by dissociative channels (F-, Cl-, FCl-, and SF5-) and only a weak SF5Cl- signal is observed.A time-of-flight analysis of the ionic fragments reveals that the decomposition of all resonances is characterized by a low translational excess energy relase indicating effective energy randomization in the parent ion prior to dissociation.The present results are compared with negative ion formation in halogenated hydrocarbons.
