14159-45-6

Basic information

• Product Name: BIS(P-TOLUENESULFONYL)DIAZOMETHANE
• Synonyms: BIS(P-TOLUENESULFONYL)DIAZOMETHANE;Bis(p-toluenesulfonyloxy)1,1'-binaphthyl
• CAS NO: 14159-45-6
• Molecular Formula: C₁₅H₁₄N₂O₄S₂
• Molecular Weight: 350.41
• Mol File: 14159-45-6.mol
• Article Data: 5

Chemical Properties

• Appearance: /
• CAS DataBase Reference: BIS(P-TOLUENESULFONYL)DIAZOMETHANE(CAS DataBase Reference)
• NIST Chemistry Reference: BIS(P-TOLUENESULFONYL)DIAZOMETHANE(14159-45-6)
• EPA Substance Registry System: BIS(P-TOLUENESULFONYL)DIAZOMETHANE(14159-45-6)

Safety Data

• Hazardous Substances Data: 14159-45-6(Hazardous Substances Data)

Usage

General Description

BIS(P-TOLUENESULFONYL)DIAZOMETHANE is a diazo compound that is commonly used in chemical reactions to convert alcohols to alkyl diazo compounds. It is a highly reactive and potentially explosive compound that should be handled with extreme caution. Its reactivity and stability make it a valuable reagent in organic synthesis, particularly in the preparation of diazo compounds for use in reactions such as the Wolff rearrangement and the Simmons-Smith reaction. However, its explosive nature also makes it a hazardous material that requires careful handling and storage.

Upstream product

• 15310-28-8 bis(4-methylphenylsulfonyl)methane 

Downstream Products

• 15310-28-8 bis(4-methylphenylsulfonyl)methane 
• 39248-95-8 S-(p-tolyl) p-methylbenzothioathe 
• 2943-42-2 di(4-methyl)phenylthiosulfonate 
• 135715-19-4 3-(Biphenyl-2-yl)-4,6-dimethyl-1-tosylbenzothiophene 
• 135715-20-7 3-Mesityl-4-phenyl-1-tosylbenzothiophene 
• 135715-17-2 1-(Biphenyl-2-yl)-5-methoxy-3-tosylbenzothiophene 
• 135715-18-3 1-(Biphenyl-2-yl)-5-chloro-3-tosylbenzothiophene 
• 135715-16-1 1-(Biphenyl-2-yl)-5-methyl-3-tosylbenzothiophene 
• 135715-15-0 1-(Biphenyl-2-yl)-3-tosylbbenzothiophene 
• 15256-83-4 Ethansulfonsaeure- 
• 117953-10-3 Triphenylarsonium bis(toluene-p-sulphonyl)methylide 

Relevant articles and documents

Resist composition, method of forming resist pattern, novel compound and acid generator

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.