14159-45-6

Usage

Uses

Used in Organic Synthesis:
BIS(P-TOLUENESULFONYL)DIAZOMETHANE is used as a reagent for converting alcohols to alkyl diazo compounds, which are crucial in organic synthesis for preparing diazo compounds that participate in key reactions.
Used in Wolff Rearrangement:
In the field of organic chemistry, BIS(P-TOLUENESULFONYL)DIAZOMETHANE is used as a precursor for the Wolff rearrangement, a reaction that converts diazo ketones into carbenes, which then insert into adjacent carbon-hydrogen bonds to form alkenes.
Used in Simmons-Smith Reaction:
BIS(P-TOLUENESULFONYL)DIAZOMETHANE is also used as a reagent in the Simmons-Smith reaction, a process that involves the reaction of alkyl halides with zinc in the presence of a copper catalyst to form alkenes.
Used in Chemical Research:
In the research industry, BIS(P-TOLUENESULFONYL)DIAZOMETHANE is used as a tool for studying the properties and reactions of diazo compounds, contributing to the advancement of organic chemistry and the development of new synthetic methods.
Safety Considerations:
Due to its explosive nature, BIS(P-TOLUENESULFONYL)DIAZOMETHANE requires careful handling, storage, and use, with strict adherence to safety protocols to prevent accidents and ensure the safety of researchers and technicians in the field of organic synthesis.

Upstream product

• 15310-28-8 bis(4-methylphenylsulfonyl)methane 

Downstream Products

• 15256-83-4 Ethansulfonsaeure- 
• 117953-10-3 Triphenylarsonium bis(toluene-p-sulphonyl)methylide 
• 15310-28-8 bis(4-methylphenylsulfonyl)methane 
• 39248-95-8 S-(p-tolyl) p-methylbenzothioathe 
• 2943-42-2 di(4-methyl)phenylthiosulfonate 
• 135715-19-4 3-(Biphenyl-2-yl)-4,6-dimethyl-1-tosylbenzothiophene 
• 135715-20-7 3-Mesityl-4-phenyl-1-tosylbenzothiophene 
• 135715-17-2 1-(Biphenyl-2-yl)-5-methoxy-3-tosylbenzothiophene 
• 135715-18-3 1-(Biphenyl-2-yl)-5-chloro-3-tosylbenzothiophene 
• 135715-16-1 1-(Biphenyl-2-yl)-5-methyl-3-tosylbenzothiophene 
• 135715-15-0 1-(Biphenyl-2-yl)-3-tosylbbenzothiophene 

Relevant academic research and scientific papers

Resist composition, method of forming resist pattern, novel compound and acid generator

A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).

Sulfonates, polymers, resist compositions and patterning process

A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process

A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimize

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.