15063-64-6Relevant academic research and scientific papers
Reaction of O(3P) with Hexamethyldisilane
Hoffmeyer, H.,Potzinger, P.,Reimann, B.
, p. 4829 - 4831 (2007/10/02)
The title reaction has been investigated at room temperature in a discharge flow system and also by stationary Hg(3P1)-sensitized N2O photolysis experiments.By far the most important reaction is the insertion of O(3P) atoms into the Si-Si bond yielding a vibrationally excited hexamethyldisiloxane.The rate constant for this reaction has been measured to be (1.3 +/- 0.3) x 10-13 cm3 s-1.The vibrationally excited hexamethyldisiloxane could not be stabilized at pressures up to 1 bar, decomposing mainly by Si-C bond cleavage.A reaction mechanism is proposed to account for the observed products.
DIRECT PHOTOLYSIS OF TETRAMETHYLSILANE IN THE GAS AND LIQUID PHASES.
Bastian,Potzinger,Ritter,Schuchmann,von Sonntag,Weddle
, p. 56 - 62 (2007/10/02)
The photolysis of tetramethylsilane at the long wavelength side of the absorption spectrum gives rise to two main primary photochemical processes: a simple Si-C bond-breaking process with a quantum yield of 0. 55 plus or minus 0. 17 and a methane elimination reaction with a quantum yield of 0. 22 plus or minus 0. 07. The radicals disappear by recombination and addition reactions to dimethylsilaethylene. Only an upper limit for the ratio of disproportionation to recombination of 0. 13 for the trimethylsilyl radicals can be given. Beside the radical addition reaction dimethylsilaethylene also dimerizes. A semiquantitative evaluation of the data shows that the radical addition reaction as well as the dimerization reaction proceed with a negligible activation energy.
