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1,9-anthracenedicarboxylic imide is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

161500-03-4

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161500-03-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 161500-03-4 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,6,1,5,0 and 0 respectively; the second part has 2 digits, 0 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 161500-03:
(8*1)+(7*6)+(6*1)+(5*5)+(4*0)+(3*0)+(2*0)+(1*3)=84
84 % 10 = 4
So 161500-03-4 is a valid CAS Registry Number.

161500-03-4Relevant academic research and scientific papers

Synthesis, photophysical and photochemical properties of photoacid generators based on N-hydroxyanthracene-1,9-dicarboxyimide and their application toward modification of silicon surfaces

Ikbal, Mohammed,Banerjee, Rakesh,Atta, Sanghamitra,Dhara, Dibakar,Anoop, Anakuthil,Singh, N. D. Pradeep

, p. 10557 - 10567 (2013/02/22)

We have introduced a series of nonionic photoacid generators (PAGs) for carboxylic and sulfonic acids based on N-hydroxyanthracene-1,9-dicarboxyimide (HADI). The newly synthesized PAGs exhibited positive solvachromatic emission (λmax(hexane) 461 nm, λmax(ethanol) 505 nm) as a function of solvent polarity. Irradiation of PAGs in acetonitrile (ACN) using UV light above 410 nm resulted in the cleavage of weak Na-O bonds, leading to the generation of carboxylic and sulfonic acids in good quantum and chemical yields. Mechanism for the homolytic Na-O bond cleavage for acid generation was supported by time-dependent density functional theory (TD-DFT) calculations. More importantly, using the PAG monomer N-(p-vinylbenzenesulfonyloxy)anthracene- 1,9-dicarboxyimide (VBSADI), we have synthesized N-(p-vinylbenzenesulfonyloxy) anthracene-1,9-dicarboxyimidea-methyl methacrylate (VBSADI-MMA) and N-(p-vinylbenzenesulfonyloxy)anthracene-1,9-dicarboxyimidea-ethyl acrylate (VBSADI-EA) copolymer through atom transfer radical polymerization (ATRP). Finally, we have also developed photoresponsive organosilicon surfaces using the aforementioned polymers.

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