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Cu(CF3C(O)CHC(O)C6H5)(C7H7OC(CH3)3) is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

164926-54-9

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164926-54-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 164926-54-9 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,6,4,9,2 and 6 respectively; the second part has 2 digits, 5 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 164926-54:
(8*1)+(7*6)+(6*4)+(5*9)+(4*2)+(3*6)+(2*5)+(1*4)=159
159 % 10 = 9
So 164926-54-9 is a valid CAS Registry Number.

164926-54-9Upstream product

164926-54-9Downstream Products

164926-54-9Relevant academic research and scientific papers

Synthesis and characterization of (β-diketonate) (7-tert-butoxynorbornadiene)copper(I) compounds, a series of new copper CVD precursors

Chi, Kai-Ming,Hou, Hung-Chang,Hung, Pao-Ts'un,Peng, Shie-Ming,Lee, Gene-Hsiang

, p. 2641 - 2648 (2008/10/09)

Organocopper compounds of the general formula (β-diketonate)Cu(7-t-BuO-NBD) where 7-t-BuO-NBD = 7-tert-butoxynorbornadiene and β-diketonate = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate (1), 1,1,1-trifluoro-2,4-pentanedionate (2), 2,4-pentanedionate (3), 4,4,4-trifluoro-1-(2-thienyl)-1,3-butanedionate (4), 4,4,4-trifluoro-1-phenyl-1,3-butanedionate (5), and 2,2-dimethyl-6,6,7,7,8,8,8-heptafluoro-3,5-octanedionate (6) were prepared by reaction of CuCl with Na(β-diketonate) in the presence of 7-t-BuO-NBD. All compounds were characterized by elemental analyses and 1H, 13C, and 19F NMR, IR, and mass spectra. Single-crystal structures of compounds 1, 4, and 5 were determined by X-ray diffraction analyses that showed mononuclear copper species with coordination of a chelating β-diketonate ligand through two oxygen atoms and the 7-t-BuO-NBD through one C=C double bond and an oxygen atom in the solid state. Variable-temperature 1H NMR spectral data of compound 2 in the solution are consistent with this structural nature. Hot-wall chemical vapor deposition experiments revealed that compound 1 is suitable as a precursor to deposit copper films in the temperature range 200-260°C. Crystallographic data for compounds 1,4, and 5: (hfac)Cu(7-t-BuO-NBD) (1) crystallizes in monoclinic system, space group P21/c, a = 8.923(1) A?, b = 19.558(4) A?, c = 10.495(3) A?, β = 90.45(2)°, V = 1831.3(7) A?3, Z = 4. (Ttfac)-Cu(7-t-BuO-NBD) (4) crystallizes in monoclinic system, space group P21/n, a = 10.689(6) A?, b = 9.712(4) A?, c = 19.323(4) A?, β = 97.22(3)°, V = 1990.2(15) A?3, Z = 4. (Btfac)Cu(7-t-BuO-NBD) (5) crystallizes in triclinic system, space group P1, a = 9.617(1) A?, b = 9.894(4) A?, c = 11.322(2) A?, α = 104.57(2)°, β = 95.50(1)°, γ = 104.76(3)°, V = 993.4(5) A?3, Z = 2.

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