165662-68-0 Usage
Uses
Used in Chemical Synthesis:
3-Benzyloxy-4-Methylbenzoic Acid is used as a key intermediate in the synthesis of various organic compounds. Its structural features allow it to participate in a wide range of chemical reactions, making it a valuable building block for the creation of new molecules.
Used in Pharmaceutical Industry:
3-Benzyloxy-4-Methylbenzoic Acid is used as a starting material for the development of pharmaceutical compounds. Its reactivity and structural properties make it a promising candidate for the synthesis of new drugs with potential therapeutic applications.
Used in Material Science:
3-Benzyloxy-4-Methylbenzoic Acid is used as a component in the development of new materials with specific properties. Its chemical reactivity and structural characteristics can contribute to the creation of advanced materials for various applications, such as in electronics or coatings.
Check Digit Verification of cas no
The CAS Registry Mumber 165662-68-0 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,6,5,6,6 and 2 respectively; the second part has 2 digits, 6 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 165662-68:
(8*1)+(7*6)+(6*5)+(5*6)+(4*6)+(3*2)+(2*6)+(1*8)=160
160 % 10 = 0
So 165662-68-0 is a valid CAS Registry Number.
InChI:InChI=1/C15H14O3/c1-11-7-8-13(15(16)17)9-14(11)18-10-12-5-3-2-4-6-12/h2-9H,10H2,1H3,(H,16,17)
165662-68-0Relevant academic research and scientific papers
HETEROCYCLIC INHIBITORS OF PCSK9
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, (2018/10/24)
This application relates to chemical compounds which may act as inhibitors of, or which may otherwise modulate the activity of, PCSK9, or a pharmaceutically acceptable salt, solvate, prodrug or polymorph thereof, and to compositions and formulations comprising such compounds, and methods of using and making such compounds. Compounds include compounds of Formula (I): (I) wherein A, D and Q are described herein.
Anthracene derivatives
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, (2008/06/13)
An anthracene derivative having at least two groups of the formula: STR1 wherein R1 and R2 are independently hydrogen, alkyl, alkoxy, etc., is particular effective for forming an antireflection coating for preventing multiple reflection of exposing light from a highly reflective substrate, etc.
Deep ultraviolet absorbent and its use in pattern formation
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, (2008/06/13)
A deep ultraviolet absorbent comprising at least one compound having one or more glycidyl groups in the molecule and at least one anthracene derivative, and a solvent capable of dissolving these compounds is effective for preventing reflection of deep ultraviolet light from a substrate during formation of resist pattern, resulting in forming ultra-fine patterns without causing notching and halation.
