16761-83-4 Usage
Uses
Used in Semiconductor Manufacturing:
Tantalum (V) isopropoxide is used as a precursor material for the deposition of tantalum and tantalum oxide thin films in semiconductor manufacturing. Its application is crucial for creating various electronic devices, such as capacitors and transistors, due to the unique electrical properties of tantalum and its oxides.
Used in Material Science Research:
In material science research, tantalum (V) isopropoxide is employed as a starting material for the synthesis of tantalum-based materials, such as ceramics, coatings, and composites. These materials exhibit desirable properties, such as high melting points, corrosion resistance, and good electrical conductivity, making them suitable for various applications in the aerospace, automotive, and electronics industries.
Used in Chemical Vapor Deposition (CVD):
Tantalum (V) isopropoxide is used as a reactant in the chemical vapor deposition process, which is a technique for depositing thin films onto substrates. This method is essential for creating high-quality films with precise control over their composition, structure, and properties, which are vital for applications in microelectronics, optoelectronics, and other advanced technologies.
Check Digit Verification of cas no
The CAS Registry Mumber 16761-83-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,6,7,6 and 1 respectively; the second part has 2 digits, 8 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 16761-83:
(7*1)+(6*6)+(5*7)+(4*6)+(3*1)+(2*8)+(1*3)=124
124 % 10 = 4
So 16761-83-4 is a valid CAS Registry Number.
InChI:InChI=1/5C3H7O.Ta/c5*1-3(2)4;/h5*3H,1-2H3;/q5*-1;+5/rC15H35O5Ta/c1-11(2)16-21(17-12(3)4,18-13(5)6,19-14(7)8)20-15(9)10/h11-15H,1-10H3
