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2,8,14,20-tetrakis(4-hydroxyphenyl)pentacyclo-[19.3.1.13,7.115,19]octacosal(25),3,5,7(28),9,11,13(27),15,17,19(26),21,23-dodecaene-4,6,10,12,16,18,22,24-octol is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

176897-13-5

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176897-13-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 176897-13-5 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,7,6,8,9 and 7 respectively; the second part has 2 digits, 1 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 176897-13:
(8*1)+(7*7)+(6*6)+(5*8)+(4*9)+(3*7)+(2*1)+(1*3)=195
195 % 10 = 5
So 176897-13-5 is a valid CAS Registry Number.

176897-13-5Downstream Products

176897-13-5Relevant academic research and scientific papers

The Synthesis and Photo-Induced Deprotection Reaction of Calix[4]resorcinarene Derivatives Containing t-Butyl Ester Moieties

Kudo, Hiroto,Mitani, Kouji,Nishikubo, Tadatomi,Mitsuishi, Masaya,Miyashita, Tokuji

, p. 819 - 826 (2004)

The syntheses and photoinduced deprotection reactions of calix[4]resorcinarene derivatives with pendant t-butyl ester moieties were examined. Calix[4]resorcinarenes, 1a-1h, were prepared by the condensation reaction of resorcinol with certain aldehydes in

Resorcinarene supramolecular organocatalyst for functionalized 1-tetralone synthesis in aqueous medium

Maity, Pampa,Mukhopadhyay, Chhanda

, p. 3895 - 3901 (2018)

An efficient, straightforward and environmentally benign process has been developed for the synthesis of fluorenone and 1-tetralone derivatives using cyclic 1,3-dione, malononitrile and dialkylacetylenedicarboxylate as starting materials in aqueous medium

Selective o-alkylation of the crown conformer of tetra(4-hydroxyphenyl)calix[4]resorcinarene to the corresponding tetraalkyl ether

Castillo-Aguirre, Alver,Rivera-Monroy, Zuly,Maldonado, Mauricio

, (2017)

Reactions of glycidyl methacrylate with the crown and chair conformers of tetra(4-hydroxyphenyl)calix[4]resorcinarene were studied. The reactions were done over epoxide groups present in the ester, which can easily undergo an opening reaction with hydroxy

Influence of the hydrogen bond on the iteroselective O-alkylation of calix[4]resorcinarenes

Castillo-Aguirre, Alver A.,Pérez-Redondo, Adrián,Maldonado, Mauricio

, (2019/12/09)

The effect of the hydrogen bond on the reactivity of hydroxyl groups of tetra(p-hydroxyphenyl)calix[4]resorcinarene with glycidyl methacrylate was studied. When the O-alkylation reaction was carried out with tetra(p-methoxyphenyl)calix[4]resorcinarene, th

Surface modification of poly(GMA-co-EDMA-co-MMA) with resorcarenes

Castillo-Aguirre, Alver A.,Velásquez-Silva, Betty A.,Palacio, Cindy,Baez, Frank,Rivera-Monroy, Zuly J.,Maldonado, Mauricio

, p. 1965 - 1972 (2018/09/04)

Surface modification of poly(GMA-co-EDMA-co-MMA), whose synthesis was performed by copolymerization of 2,3-epoxypropyl methacrylate (GMA), methyl methacrylate (MMA), and ethylene glycol dimethacrylate (EDMA), was compared between aliphatic and aromatic su

MACROCYCLIC POLYPHENOLS FOR UNIVERSAL COATINGS

-

Paragraph 0088, (2017/09/15)

The disclosure provides for coating compositions comprising macrocycles and salts in aqueous buffer and the use of the coating composition to prevent absorption of small molecules into polymeric surfaces.

Solid state NMR investigation of photoresist molecular glasses including blend behavior with a photoacid generator

Vanderhart, David L.,Prabhu, Vivek M.,De Silva, Anuja,Felix, Nelson M.,Ober, Christopher K.

experimental part, p. 2683 - 2694 (2010/05/19)

We have examined four molecular glass (MG) materials that show promise as photoresists for extreme-ultraviolet (EUV) lithography. These glass-forming materials were investigated by proton and 13C solid state nuclear magnetic resonance (NMR) tec

Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography

Chang, Seung Wook,Ayothi, Ramakrishnan,Bratton, Daniel,Yang, Da,Felix, Nelson,Cao, Heidi B.,Deng, Hai,Ober, Christopher K.

, p. 1470 - 1474 (2007/10/03)

Extreme ultra violet (EUV) lithography is one of the most promising next generation lithographic techniques for the production of sub-50 nm feature sizes with applications in the semiconductor industry. Coupling this technique with molecular glass resists

Rapid synthesis of dendrimers based on calix[4]resorcinarenes

Yamakawa, Yoshitaka,Ueda, Mitsuru,Nagahata, Ritsuko,Takeuchi, Kazuhiko,Asai, Michihiko

, p. 4135 - 4139 (2007/10/03)

Calix[4]resorcinarenes are phenolic macrocyclic compounds, and readily available from resorcinols and aldehydes. We were interested in calix[4]resorcinarenes as highly functionalized core molecules for the rapid synthesis of dendrimers because of their ea

Designing of resorcinol-p-hydroxybenzaldehyde tetramer for uranophilic activity

Singh, Harmit,Singh, Serjinder

, p. 409 - 412 (2007/10/03)

Resorcinol-p-hydroxybenzaldehyde tetramer (1) has been obtained under acidic conditions, separated into its conformations and characterized by 1H NMR and 13C NMR spectra and through the preparation of its octaacetate. The direct carboxymethylation of 1 has been attempted with chloroacetic acid under basic conditions but due to steric repulsions, the tetramer 2a could not be obtained. Using the reverse approach p-hydroxybenzaldehyde is carboxymethylated first to get 6 which is then cyclized under acidic conditions to yield the tetramer 2b. Compound 2a has been characterized as its acetylated ethyl ester 3 by 1H NMR spectral data and elemental analysis. The two conformations of 3 have been separated by repeated recrystallization from acetonitrile and their purity has been checked by 1H NMR spectra. The tetramer 2a is obtained by hydrolysis of 3 with NaOH (1N). The coplanar arrangement of carboxylate groups in 2a is utilized to bind uranyl ion. The binding as shown by Job's plot does not show 1:1 (2a: UO22+) ratio due to fourth carboxylate group, but it acts as a good uranophile as indicated by an increase in the intensity of UO22+ ions in UV absorption in the presence of 3.

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