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1770-54-3

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1770-54-3 Usage

Uses

Perphenylcyclopentasilane is an intermediate in the synthesis of Cyclopentasilane (C988380), a reagent used for depositing silicon on surfaces for electronics applications.

Check Digit Verification of cas no

The CAS Registry Mumber 1770-54-3 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,7,7 and 0 respectively; the second part has 2 digits, 5 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 1770-54:
(6*1)+(5*7)+(4*7)+(3*0)+(2*5)+(1*4)=83
83 % 10 = 3
So 1770-54-3 is a valid CAS Registry Number.
InChI:InChI=1/C60H50Si5/c1-11-31-51(32-12-1)61(52-33-13-2-14-34-52)62(53-35-15-3-16-36-53,54-37-17-4-18-38-54)64(57-43-23-7-24-44-57,58-45-25-8-26-46-58)65(59-47-27-9-28-48-59,60-49-29-10-30-50-60)63(61,55-39-19-5-20-40-55)56-41-21-6-22-42-56/h1-50H

1770-54-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name 1,1,2,2,3,3,4,4,5,5-decakis-phenylpentasilolane

1.2 Other means of identification

Product number -
Other names Cyclopentasilane,1,1,2,2,3,3,4,4,5,5-decaphenyl

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1770-54-3 SDS

1770-54-3Relevant articles and documents

Cyclopentasilane Si5H10: First single crystal X-ray structure of an oligosilane SixHy and thermal analysis with TG/MS

Schmidt, Dana,B?hme, Uwe,Seidel, Jürgen,Kroke, Edwin

, p. 92 - 95 (2013)

Cyclopentasilane Si5H10 (CPS) - a liquid silicon precursor - was crystallized in situ at - 100 C which allowed determination of the single crystal X-ray structure, showing short intermolecular distances below the sum of the v.d.Waals

Hengge,Marketz

, p. 890 (1969)

Cyclosilane compound, and solution composition and process for forming a silicon film

-

, (2008/06/13)

Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro[4.4]nonasilane.

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