18148-73-7Relevant academic research and scientific papers
Reactions of difluorosilylene with amines, phosphines and halomethanes the first evidence of the insertion of difluorosilylene into tetrafluorosilane
Chang, Chih-Wei,Liu, Chao-Shiuan,Lee, Chi-Young
, p. 445 - 452 (2007/10/03)
The reactions of SiF2/SiF4 with amines, phosphines and various halomethanes were studied. The results show that in the presence of strong Lewis base (Et3N, HNEt2, PR3, PR2Cl), SiF2 inserts initially into SiF4 to form Si2F6, which was followed by subsequent reactions leading to products containing SiF3 groups. This is the first report of the insertion of SiF2 into SiF4. When the reactants were a weaker base (such as RPCl2, CX3Br, X=F, Cl), insertion of SiF2 into P-Cl and C-Br bonds became predominant.
