18166-43-3

Basic information

• Product Name: TRI-T-BUTOXYSILANOL
• Synonyms: TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Silicic acid, tris(1,1-diMethylethyl) ester;Tri-tert-butyl hydrogen orthosilicate;Tri-t-butoxysilanol (99.999%-Si) PURATREM;Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD
• CAS NO: 18166-43-3
• Molecular Formula: C₁₂H₂₈O₄Si
• Molecular Weight: 264.43
• Product Categories: Silanes;Solution Deposition Precursors;Micro/Nanoelectronics;Organosilicon;Precursors by Metal;Precursors Packaged for Deposition SystemsOrganometallic Reagents;SilanolsVapor Deposition Precursors;Vapor Deposition Precursors;14: Silicon;Chemical Synthesis;CVD and ALD Precursors by Metal;CVD and ALD Precursors Packaged for Deposition Systems;Materials Science;Organometallic Reagents;Silanols;Silicon;Vapor Deposition Precursors
• Mol File: 18166-43-3.mol
• Article Data: 3

Chemical Properties

• Melting Point: 63-65 °C(lit.)
• Boiling Point: 205-210 °C(lit.)
• Flash Point: >65°C
• Appearance: /
• Density: 0,92 g/cm3
• Vapor Pressure: 0.00145mmHg at 25°C
• Refractive Index: 1.436
• Storage Temp.: below 5° C
• PKA: 11.78±0.53(Predicted)
• Sensitive: moisture sensitive
• CAS DataBase Reference: TRI-T-BUTOXYSILANOL(CAS DataBase Reference)
• NIST Chemistry Reference: TRI-T-BUTOXYSILANOL(18166-43-3)
• EPA Substance Registry System: TRI-T-BUTOXYSILANOL(18166-43-3)

Safety Data

• Statements: 36/37/38
• Safety Statements: 22-24/25
• WGK Germany: 3
• TSCA: No
• Hazardous Substances Data: 18166-43-3(Hazardous Substances Data)

Usage

Uses

Different sources of media describe the Uses of 18166-43-3 differently. You can refer to the following data:
1. Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
2. Precursors Packaged for Depositions Systems
3. Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

General Description

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

InChI:InChI=1/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3

Upstream product

• 502635-70-3 (tert-butoxy)B[tris(tert-butoxy)siloxy]2 
• 7732-18-5 water 
• 502635-71-4 B[tris(tert-butoxy)siloxy]3 
• 18395-80-7 di-t-butoxydichlorosilane 
• 18105-64-1 tri-tert-butoxy-chloro-silane 
• 865-48-5 sodium t-butanolate 

Downstream Products

• 1137895-28-3 [HC(C(Me)N(2,6-i-Pr-C6H3))2]Al(H)(μ-O)Si(O-t-Bu)3 
• 4045-44-7 1,2,3,4,5-pentamethylcyclopentadiene 
• 1137895-29-4 [HC(C(Me)N(2,6-i-Pr-C6H3))2]Al(SH)(μ-O)Si(O-t-Bu)3 
• 1137895-30-7 [HC(C(Me)N(2,6-i-Pr-C6H3))2]Al(OH)(μ-O)Si(O-t-Bu)3 
• 874947-50-9 [(tetraphenylporphyrin)Sn(IV)(OSi(O-tert-Bu)3)2] 
• 423121-21-5 [(2,6-i-Pr₂C₆H₃NSiMe₃)SiO₃Ti(O-t-Bu)]4 
• 112926-00-8 silica gel 
• 24599-92-6 C₃₀H₆₂N₂O₈Si₃ 
• 24599-90-4 C₃₆H₆₄O₁₀Si₃ 
• 24599-89-1 C₃₀H₆₁NO₉Si₃ 
• 676160-91-1 C₂₈H₄₉ClO₆Si₄ 
• 676160-90-0 C₂₆H₄₄O₆Si₃ 

Relevant articles and documents

Facile Synthesis of Unsymmetrical Trialkoxysilanols: (RO)2(R′O)SiOH

Trialkoxysilanols, (RO)3SiOH, are useful as ligands in transition-metal complexes because they provide models for silica-supported metal sites or precursors for the thermolytic precursor approach. However, their synthesis is mostly limited to symmetrical ones, where all RO ligands are the same. However, unsymmetrically substituted trialkoxysilanols could offer significant advantages over their symmetrical counterparts by facilitating crystallization of complexes, lowering crystallographic disorder, changing the thermal properties of the complexes made, and making the addition of pendant functional groups possible. Herein, a simple, general synthetic procedure yielding unsymmetrical trialkoxysilanols (RO)2(R′O)SiOH is presented using imidazole as a promoter.

Tris(tert-butoxy)siloxy derivatives of boron, including the boronous acid HOB[OSi(OtBu)3]2 and the metal (siloxy)boryloxide complex Cp2Zr(Me)OB[OSi(OtBu)3]2: A remarkable crystal structure with 18 independent molecules in its asymmetric unit

Silanolysis of B(OtBu)3 with 2 and 3 equiv of HOSi(OtBu)3 led to the formation of BuOB[OSi(OtBu)3]2 (1) and B[OSi(OtBu)3]3 (2), respectively. Compounds 1 and 2 are efficient single-source molecular precursors to B/Si/O materials via thermolytic routes in nonpolar media, as demonstrated by the generation of BO1.5·2SiO2 (BOSi2xg and BO1.5·3SiO2 (BOSi3xg) xerogels, respectively. Use of a block copolymer template provided B/Si/O materials (BOSi2epe and BOSi3epe) with a broad distribution of mesopores (by N2 porosimetry) and smaller, more uniform particle sizes (by TEM) as compared to the nontemplated materials. Hydrolyses of 1 and 2 with excess H2O resulted in formation of the expected amounts of tBuOH and HOSi(OtBu)3; however, reaction of 1 with 1 equiv of H2O led to isolation of the new boronous acid HOB[OSi(OtBu)3]2 (3). This ligand precursor is well suited for the synthesis of new metal (siloxy)boryloxide complexes via proton-transfer reactions involving the BOH group. The reaction of 3 with Cp2ZrMe2 resulted in formation of Cp2Zr(Me)OB[OSi(OtBu)3]2 (4) in high yield. This rare example of a transition metal boryloxide complex crystallizes in the triclinic space group P1 and exhibits a crystal structure with an unprecedented number of independent molecules in its asymmetric unit (i.e., Z = 18 and Z = 36). This unusual crystal structure presented an opportunity to perform statistical analyses of the metric parameters for the 18 crystallographically independent molecules. Complex 4 readily converts to Cp2Zr[OSi(OtBu)3]2 (5) upon thermolysis or upon dissolution in Et2O at room temperature.