18407-94-8 Usage
Uses
Used in Semiconductor Industry:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a precursor for the production of silicon dioxide films, which are essential in the manufacturing of semiconductor devices due to their excellent adhesion and chemical stability.
Used in Optical Industry:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a material for creating thin films with uniform and smooth surfaces, which are crucial for optical applications requiring high-quality film properties.
Used in Surface Modification:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a surface modification agent to enhance the properties of various materials, improving their performance in different applications.
Used in Coatings, Adhesives, and Sealants:
TETRAKIS(ETHOXYETHOXY)SILANE is used as a component in the formulation of coatings, adhesives, and sealants, contributing to their excellent adhesion and chemical stability, making them suitable for various industrial applications.
Check Digit Verification of cas no
The CAS Registry Mumber 18407-94-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,8,4,0 and 7 respectively; the second part has 2 digits, 9 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 18407-94:
(7*1)+(6*8)+(5*4)+(4*0)+(3*7)+(2*9)+(1*4)=118
118 % 10 = 8
So 18407-94-8 is a valid CAS Registry Number.
InChI:InChI=1/C16H36O8Si/c1-5-17-9-13-21-25(22-14-10-18-6-2,23-15-11-19-7-3)24-16-12-20-8-4/h5-16H2,1-4H3
18407-94-8Relevant academic research and scientific papers
Reaction of silicon with alcohols in autoclave
Krylova,Egorov,Nefedov
, p. 260 - 266 (2017/07/11)
A reaction of activated silicon with alcohols in an autoclave at 240—270 °C was studied. It was found that primary alcohols form tetraalkoxysilanes Si(OR)4 with high selectivity (up to 97%), while the secondary PriOH gave a mixture of compounds HSi(OPri)3, Si(OPri)4, HSi(OPri)2OSi(OPri)2H, HSi(OPri)2OSi(OPri)3, and Si(OPri)3OSi(OPri)3 with the predominance of trialkoxysilane (up to 67%). Carrying out the reaction under the indicated conditions has the advantage of experimental simplicity, reagent availability, high conversion of silicon, good isolated yields of products.
