199122-95-7

Upstream product

• 52536-97-7 4-chloro-1-(2-chloroethyl)-2-nitro-benzene 
• 16764-17-3 2-(4-chloro-2-nitrophenyl)ethan-1-ol 
• 89-59-8 4-chloro-2-nitrotoluene 

Downstream Products

• 199123-01-8 2-(4-Chloro-2-nitro-phenyl)-ethanesulfonic acid (2R,3S,5R)-3-hydroxy-5-{4-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-2-oxo-2H-pyrimidin-1-yl}-tetrahydro-furan-2-ylmethyl ester 
• 215600-70-7 2-(4-Chloro-2-nitro-phenyl)-ethanesulfonic acid (2R,3S,5R)-3-hydroxy-5-{6-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-purin-9-yl}-tetrahydro-furan-2-ylmethyl ester 
• 215600-75-2 2-(4-Chloro-2-nitro-phenyl)-ethanesulfonic acid (2R,3S,5R)-3-hydroxy-5-{6-[2-(4-nitro-phenyl)-ethoxy]-2-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-purin-9-yl}-tetrahydro-furan-2-ylmethyl ester 
• 215600-58-1 2-(4-Chloro-2-nitro-phenyl)-ethanesulfonic acid (2R,3S,5R)-3-hydroxy-5-(5-methyl-2,4-dioxo-3,4-dihydro-2H-pyrimidin-1-yl)-tetrahydro-furan-2-ylmethyl ester 

Relevant academic research and scientific papers

Nucleoside derivatives with photolabile protective groups

The invention relates to nucleo-side derivatives with photo-unstable protective groups of the general formula (I) in which R1 is H, NO2, CN, OCH3, halogen, alkyl or alkoxyalkyl with 1 to 4 C atoms, R2 is H, OCH3, R3 is H, F, Cl, Br, NO2 or an aliphatic ac

New photolabile protecting groups of the 2-(2- nitrophenyl)ethoxycarbonyl-and the 2-(2-nitrophenyl)ethylsulfonyl-type for the oligonucleotide synthesis

New photolabile blocking groups have been synthesized and introduced into the 5'-OH position of thymidine. The 5'-O-protected thymidines were irradiated at 365 nm under identical conditions and the half-lives and thymidine yields were determined to investigate the influence of different substituents in the two corresponding series.

New photolabile protecting groups in nucleoside and nucleotide chemistry - Synthesis, cleavage mechanisms and applications

New photolabile protecting groups have been found in the 2-(2- nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. β-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced β-elimination process is proposed.