20032-64-8

Upstream product

• 855195-03-8 2-[2,6-bis-(toluene-4-sulfonyloxy)-phenoxy]-5-nitro-benzophenone 
• 854024-78-5 2-(2,6-dihydroxy-phenoxy)-5-nitro-benzophenone 
• 408337-55-3 2-(2-hydroxy-phenoxy)-5-nitro-benzophenone 
• 20032-65-9 2,6-bis-(toluene-4-sulfonyloxy)-phenol 
• 98-59-9 p-toluenesulfonyl chloride 

Downstream Products

• 5333-45-9 1,2,3,5-tetramethoxybenzene 
• 20660-35-9 2,3,5-Trimethoxy-phenol 
• 20032-41-1 1,2,5-Trimethoxy-3-p-tosyloxy-benzol 
• 20032-74-0 4-Amino-2,6-bis-p-toluolsulfonyloxy-phenol 
• 20032-36-4 1,4-Dihydroxy-2,6-bis-(p-tosyloxy)-benzol 
• 20032-45-5 2,5-Dimethoxy-1,3-bis-(p-tosyloxy)-benzol 
• 20032-69-3 4-Nitro-2,6-bis-p-tosyloxy-phenol 
• 20032-39-7 2,5-Dimethoxy-3-p-tosyloxy-phenol 
• 20032-29-5 2,6-Bis-(p-tosyloxy)-benzochinon-(1,4) 
• 20032-65-9 2,6-bis-(toluene-4-sulfonyloxy)-phenol 
• 20032-66-0 2,3-Bis-p-tosyloxy-phenol 

Relevant academic research and scientific papers

Sulfonates, polymers, resist compositions and patterning process

A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance