214534-44-8Relevant academic research and scientific papers
α-Arylation by rearrangement: On the reaction of enolates with diaryliodonium salts
Norrby, Per-Ola,Petersen, Tue B.,Bielawski, Marcin,Olofsson, Berit
supporting information; experimental part, p. 8251 - 8254 (2010/10/18)
Surprising equilibration: A new mechanism for the title reaction is supported by DFT calculations and experimental observations. The C-I and OI intermediates are isoenergetic and equilibrate quickly. Thus, any chiral information induced in the initial complex will be destroyed. In the final CC bond-forming step, a [2,3]-rearrangement from the O-I bonded intermediate is slightly preferred over the [1,2]elimination from the C-I bonded isomer (see scheme). (Figure Presented)
Process for producing onium salt derivative and novel onium salt derivative
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, (2008/06/13)
The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containi
Novel anthracene derivative and radiation-sensitive resin composition
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, (2008/06/13)
A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.
Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
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, (2008/06/13)
A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
