218769-04-1Relevant articles and documents
Design and synthesis of new polymeric materials for organic nonvolatile electrical bistable storage devices: Poly(biphenylmethylene)s
Beinhoff, Matthias,Bozano, Luisa D.,Scott, J. Campbell,Carter, Kenneth R.
, p. 4147 - 4156 (2005)
The synthesis of new polymers, poly(biphenylmethylene)s, derived from bistriflates of bisphenol-type monomers, by Ni(0)-mediated polymerization has been presented. These polymers are interesting because of the nature of the polymer backbone that contains
Convenient synthetic route to tetraarylphosphonium polyelectrolytes via palladium-catalyzed P–C coupling of aryl triflates and diphenylphosphine
Wan, Wang,Yang, Xiaoyan,Smith, Rhett C.
, p. 1984 - 1990 (2017/05/08)
A series of eight tetraarylphosphonium polyelectrolytes (TPELs) has been successfully synthesized by polymerization of diphenylphosphine and bis(aryl triflate)s. The bis(aryl triflate)s are readily prepared from bisphenols, some of which are commodity fee
Optically active compound and photosensitive resin composition
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, (2008/06/13)
A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A?[(J)m?(X-Pro)]n ??(1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
