23684-11-9Relevant articles and documents
Diester structure monomer, preparation method thereof and application
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Paragraph 0071-0078, (2021/02/10)
The invention provides a diester structure monomer, a preparation method thereof and application of an ArF photoresist formula. The preparation method of the diester structure monomer comprises the following steps of: dissolving glycolate in a reaction solvent to prepare a glycolate solution; mixing the glycolate solution with triethylamine in a protective atmosphere, and performing cooling to form a mixed solution; and keeping the protective atmosphere unchanged, and adding methacryloyl chloride into the mixed solution to carry out esterification reaction, thereby generating the diester structure monomer. According to the preparation method of the diester structure monomer, the generated diester structure monomer has a diester long side chain and a group with small size and high acid sensitivity; resin synthesized by the diester structure monomer is endowed with better adhesive force and film-forming property, deprotection reaction efficiency and plasticity, and the hardness and brittleness of the resin are improved. And the prepared diester acid protection structure monomer has the advantages of higher yield, low by-product content and easiness in separation and purification.