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2627-95-4

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2627-95-4 Usage

Chemical Properties

Colorless or yellowish transparent liquid

Uses

Different sources of media describe the Uses of 2627-95-4 differently. You can refer to the following data:
1. Divinyl tetramethyl disiloxane could be used as a additives(intermediates) in the production process of addition silicone rubber, silicone gel, liquid silicone, vinyl silicone resin, vinyl silicone oil, platinum chromium compound and others. POTENTIAL VINYL NUCLEOPHILE IN CROSS-COUPLING REACTIONS. 1,3-Divinyltetramethyldisiloxane acts as a potential vinyl donor used in cross-coupling reactions. It is also involved in the copolymerization reaction with aromatic ketones.
2. 1,3-Divinyltetramethyldisiloxane acts as a potential vinyl donor used in cross-coupling reactions. It is also involved in the copolymerization reaction with aromatic ketones.

Flammability and Explosibility

Flammable

Check Digit Verification of cas no

The CAS Registry Mumber 2627-95-4 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,6,2 and 7 respectively; the second part has 2 digits, 9 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 2627-95:
(6*2)+(5*6)+(4*2)+(3*7)+(2*9)+(1*5)=94
94 % 10 = 4
So 2627-95-4 is a valid CAS Registry Number.
InChI:InChI=1/C8H18OSi2/c1-7-11(6,8-2)9-10(3,4)5/h7-8H,1-2H2,3-6H3

2627-95-4 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (D1780)  1,3-Divinyltetramethyldisiloxane  >98.0%(GC)

  • 2627-95-4

  • 25mL

  • 329.00CNY

  • Detail
  • TCI America

  • (D1780)  1,3-Divinyltetramethyldisiloxane  >98.0%(GC)

  • 2627-95-4

  • 100mL

  • 848.00CNY

  • Detail
  • Alfa Aesar

  • (A12463)  1,3-Divinyltetramethyldisiloxane, 96%, cont. up to 4% 1-vinyl-3-ethyltetramethyldisiloxane   

  • 2627-95-4

  • 25g

  • 642.0CNY

  • Detail
  • Alfa Aesar

  • (A12463)  1,3-Divinyltetramethyldisiloxane, 96%, cont. up to 4% 1-vinyl-3-ethyltetramethyldisiloxane   

  • 2627-95-4

  • 100g

  • 1235.0CNY

  • Detail
  • Aldrich

  • (371904)  1,3-Divinyltetramethyldisiloxane  97%

  • 2627-95-4

  • 371904-10G

  • 567.45CNY

  • Detail
  • Aldrich

  • (371904)  1,3-Divinyltetramethyldisiloxane  97%

  • 2627-95-4

  • 371904-50G

  • 1,310.40CNY

  • Detail

2627-95-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name Divinyltetramethyldisiloxane

1.2 Other means of identification

Product number -
Other names 3,3,5,5-tetramethyl-3,5-disila-4-oxa-1,6-heptadiene

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Intermediates,Solvents (which become part of product formulation or mixture)
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2627-95-4 SDS

2627-95-4Synthetic route

dimethylvinylsilane
18243-27-1

dimethylvinylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With sodium hydroxide at 68℃; for 4h;96%
ethoxydimethylvinylsilane
5356-83-2

ethoxydimethylvinylsilane

(2-methylallyl)-dimethylvinylsilane
1351415-92-3

(2-methylallyl)-dimethylvinylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With water; scandium tris(trifluoromethanesulfonate) In acetonitrile at 20℃; for 1h;94%
ethoxydimethylvinylsilane
5356-83-2

ethoxydimethylvinylsilane

A

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

B

2-methyl-3-butene-2-ol, sodium salt
79238-55-4

2-methyl-3-butene-2-ol, sodium salt

Conditions
ConditionsYield
With water; sodium hydroxide at 20℃;A 60%
B 40%
triisopropylsilanol
17877-23-5

triisopropylsilanol

(2-methylallyl)-dimethylvinylsilane
1351415-92-3

(2-methylallyl)-dimethylvinylsilane

A

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

B

1,1-dimethyl-3,3,3-triisopropyl-1-vinyldisiloxane
1351415-84-3

1,1-dimethyl-3,3,3-triisopropyl-1-vinyldisiloxane

Conditions
ConditionsYield
With n-heptan1ol; scandium tris(trifluoromethanesulfonate) In water; acetonitrile at 22℃; for 0.5h;A 19%
B 58%
diethyl ether
60-29-7

diethyl ether

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride
ethoxydimethylvinylsilane
5356-83-2

ethoxydimethylvinylsilane

acetone
67-64-1

acetone

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride
Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With lithium oxide In diethyl ether Yield given;
With water
(1-hydrohexafluoroisobutenyloxy)trimethylsilane
857899-86-6

(1-hydrohexafluoroisobutenyloxy)trimethylsilane

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

A

dimethyl-(3,3,3-trifluoro-2-trifluoromethyl-propenyloxy)-vinyl-silane

dimethyl-(3,3,3-trifluoro-2-trifluoromethyl-propenyloxy)-vinyl-silane

B

1,1,3,3,3-pentamethyl-1-vinyldisiloxane
1438-79-5

1,1,3,3,3-pentamethyl-1-vinyldisiloxane

C

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

D

dimethyl vinyl fluorosilane
38755-76-9

dimethyl vinyl fluorosilane

Conditions
ConditionsYield
Stage #1: (1-hydrohexafluoroisobutenyloxy)trimethylsilane With cesium fluoride In diethylene glycol dimethyl ether at -10℃; for 2h;
Stage #2: Chlorodimethylvinylsilane In diethylene glycol dimethyl ether at -10℃; for 2h; Further byproducts given;
CF3C(O)CH(OSiMe2(C2H3))CF3
206356-44-7

CF3C(O)CH(OSiMe2(C2H3))CF3

N-methyl-ethane-1,2-diamine
109-81-9

N-methyl-ethane-1,2-diamine

A

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

B

CF3C(O)CH2(NCH2CH2NHMe)CF3

CF3C(O)CH2(NCH2CH2NHMe)CF3

Conditions
ConditionsYield
for 2h;
Triethoxyvinylsilane
78-08-0

Triethoxyvinylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With [D]-sodium hydroxide; water-d2; palladium diacetate; sodium 4-iodo-benzoate at 30℃; for 20h;100 %Spectr.
C36H56N2OPdSi2

C36H56N2OPdSi2

A

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

B

1,3-bis(2,6-diisopropylphenyl)-2-methylene-2,3-dihydro-1H-imidazole
1315461-59-6

1,3-bis(2,6-diisopropylphenyl)-2-methylene-2,3-dihydro-1H-imidazole

Conditions
ConditionsYield
In benzene-d6 at 80℃;
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

acetylene
74-86-2

acetylene

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With dichlorotricarbonylruthenium(II) dimer; N,N-dimethyl-aniline In 1,4-dioxane at 50℃; under 3750.38 Torr; for 24h; Temperature; Pressure; Solvent;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

1,1,3,3,3-pentamethyl-1-vinyldisiloxane
1438-79-5

1,1,3,3,3-pentamethyl-1-vinyldisiloxane

C

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With water at 0 - 10℃; for 2h;
In water at 0 - 20℃;A 22 %Chromat.
B 49 %Chromat.
C 28 %Chromat.
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

Chlorodimethylvinylsilane
1719-58-0

Chlorodimethylvinylsilane

A

1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

B

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

C

1,1,3,3-tetramethyl-1-vinyldisiloxane
55967-52-7

1,1,3,3-tetramethyl-1-vinyldisiloxane

Conditions
ConditionsYield
In water at 0 - 20℃;A 11 %Chromat.
B 26 %Chromat.
C 62 %Chromat.
bis(triphenylphosphine)palladium(0)
31989-57-8

bis(triphenylphosphine)palladium(0)

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

[Pd((η(2)-CH2CHSiMe2)2O)P(C6H5)3]
252008-09-6

[Pd((η(2)-CH2CHSiMe2)2O)P(C6H5)3]

Conditions
ConditionsYield
at 25℃; for 0.166667h; Inert atmosphere;100%
[(C5Me5)Rh(vinyltrimethylsilane)2]
227025-38-9, 242806-77-5

[(C5Me5)Rh(vinyltrimethylsilane)2]

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

(η(5)-C5Me5)Rh[(η(4)-(CH2=CHSiMe2)2O)]
503091-93-8, 174735-70-7, 174847-75-7

(η(5)-C5Me5)Rh[(η(4)-(CH2=CHSiMe2)2O)]

Conditions
ConditionsYield
In not given Rh complex was reacted with ligand;99%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

2,4,6-trimethylphenyl bromide
576-83-0

2,4,6-trimethylphenyl bromide

2,4,6-trimethylstyrene
769-25-5

2,4,6-trimethylstyrene

Conditions
ConditionsYield
With johnphos; bis(η3-allyl-μ-chloropalladium(II)) In N,N-dimethyl-formamide at 40℃; for 24h;99%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

copper(I) bromide
7787-70-4

copper(I) bromide

[divinyltetramethyldisiloxane]2[Cu4Br4]

[divinyltetramethyldisiloxane]2[Cu4Br4]

Conditions
ConditionsYield
In neat (no solvent) CuBr dissolved in divinyltetramethyldisiloxane; crystd. for 1 d, elem. anal.;99%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

copper(l) chloride

copper(l) chloride

[divinyltetramethyldisiloxane]2[Cu4Cl4]

[divinyltetramethyldisiloxane]2[Cu4Cl4]

Conditions
ConditionsYield
In neat (no solvent) CuCl dissolved in divinyltetramethyldisiloxane; crystd. for 1 d, elem. anal.;99%
(N,N,N',N'-tetramethylethylenediamine)dimethylpalladium(II)

(N,N,N',N'-tetramethylethylenediamine)dimethylpalladium(II)

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

tris(2,4,6-trimethoxyphenyl)phosphine
91608-15-0

tris(2,4,6-trimethoxyphenyl)phosphine

Pd(P(C6H2(OCH3)3)3)(CH2CHSi(CH3)2OSi(CH3)2CHCH2)
1222557-48-3

Pd(P(C6H2(OCH3)3)3)(CH2CHSi(CH3)2OSi(CH3)2CHCH2)

Conditions
ConditionsYield
In neat (no solvent) (Ar, Schlenk) a suspn. of Rh-complex and phosphine in degassed and driedsiloxane-compound was stirred at room temp. overnight; the solvent was removed under vac., the solid was washed with a small portion of diethyl ether or pentane at -50°C;99%
[(cyclopentadienyl)Co(trimethylvinylsilane)2]
189282-65-3

[(cyclopentadienyl)Co(trimethylvinylsilane)2]

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

[(cyclopentadienyl)Co(1,3-divinyl-1,1,3,3-tetramethyldisiloxane)]
1246272-89-8

[(cyclopentadienyl)Co(1,3-divinyl-1,1,3,3-tetramethyldisiloxane)]

Conditions
ConditionsYield
In diethyl ether byproducts: (CH3)3SiCHCH2; (Ar), Schlenk techniques; dropwise addn. of O compd. to soln. of Co complex in Et2O at -30°C over 2 min, stirring for 5 min; evapn. under reduced pressure at -20°C, drying under vacuum;99%
methylthiol
74-93-1

methylthiol

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,1,3,3-tetramethyl-1,3-bis(2-(methylthio)ethyl)disiloxane

1,1,3,3-tetramethyl-1,3-bis(2-(methylthio)ethyl)disiloxane

Conditions
ConditionsYield
With C38H28Au2F12FeN2O8P2S4 In 1,4-dioxane at 45℃; for 20h; Inert atmosphere; Glovebox; Sealed tube;99%
4-[(dimethyl(vinyl)silyl)]morpholine
1000598-40-2

4-[(dimethyl(vinyl)silyl)]morpholine

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

tris(vinyldimethylsilyl)phosphate

tris(vinyldimethylsilyl)phosphate

Conditions
ConditionsYield
Stage #1: tetramethyldivinyldisiloxane With phosphoric acid at 105 - 115℃; for 3h; Reflux; Large scale;
Stage #2: 4-[(dimethyl(vinyl)silyl)]morpholine at -10℃; Reflux; Large scale;
97.11%
Triethoxysilane
998-30-1

Triethoxysilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,3-bis(triethoxysilylethyl)tetramethyldisiloxane

1,3-bis(triethoxysilylethyl)tetramethyldisiloxane

Conditions
ConditionsYield
With (TFAPDI)Co(2-ethylhexanoate)2 In neat (no solvent) at 23℃; for 1h;97%
Dichloromethylsilane
75-54-7

Dichloromethylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

allylmagnesium bromide
2622-05-1

allylmagnesium bromide

C22H46OSi4

C22H46OSi4

Conditions
ConditionsYield
Stage #1: Dichloromethylsilane; tetramethyldivinyldisiloxane With platinum In toluene at 60℃; Inert atmosphere;
Stage #2: allylmagnesium bromide In tetrahydrofuran at 60℃; for 1.16667h; Inert atmosphere; Cooling with ice;
97%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,1,3,3,3-pentamethyl-1-vinyldisiloxane
1438-79-5

1,1,3,3,3-pentamethyl-1-vinyldisiloxane

Conditions
ConditionsYield
With 18-crown-6 ether; potassium hydroxide at 80℃; for 1h;96.2%
With Lewatit SPC 118 for 5h; Ambient temperature;17 g
bis(1,5-cyclooctadiene)nickel (0)
1295-35-8

bis(1,5-cyclooctadiene)nickel (0)

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

[Ni2(1,1,3,3-tetramethyl-1,3-divinyldisiloxane)3]
189372-83-6

[Ni2(1,1,3,3-tetramethyl-1,3-divinyldisiloxane)3]

Conditions
ConditionsYield
In diethyl ether byproducts: Ni, cyclooctadiene; overnight at ambient temp.; volatiles removed (vac.), taken up into pentane, filtered (Celite), concd.;95%
In diethyl ether at 20℃; for 24h; Schlenk technique; Inert atmosphere;50%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide
35948-25-5

9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide

C20H27O3PSi2

C20H27O3PSi2

Conditions
ConditionsYield
Stage #1: 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In 1,4-dioxane at 80℃; for 0.5h; Autoclave; Inert atmosphere; High pressure;
Stage #2: tetramethyldivinyldisiloxane In 1,4-dioxane; cyclohexane at 80℃; for 20h; Reagent/catalyst; Solvent; Temperature; High pressure;
95%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,1,3,3-tetramethyl-1,3-bis(2-(trichloro-silyl)ethyl)disiloxane

1,1,3,3-tetramethyl-1,3-bis(2-(trichloro-silyl)ethyl)disiloxane

Conditions
ConditionsYield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex; trichlorosilane In toluene at 20℃; for 18h; Inert atmosphere; Schlenk technique;95%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

diphenylsilanediol
947-42-2

diphenylsilanediol

1,5-divinyl-3,3-diphenyl-1,1,5,5-tetramethyltrisiloxane
18586-22-6

1,5-divinyl-3,3-diphenyl-1,1,5,5-tetramethyltrisiloxane

Conditions
ConditionsYield
With toluene-4-sulfonic acid In hexane at 70 - 80℃; for 2h; Reagent/catalyst; Inert atmosphere; Green chemistry;94.6%
dimethyldimethoxysilan
1112-39-6

dimethyldimethoxysilan

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,1,3,3,5,5-hexamethyl-1,5-divinyltrisiloxane
17980-39-1

1,1,3,3,5,5-hexamethyl-1,5-divinyltrisiloxane

Conditions
ConditionsYield
With iron(III) chloride at 70 - 80℃; for 4h; Temperature; Reagent/catalyst;94.2%
With trifluorormethanesulfonic acid; acetic anhydride; acetic acid at 50℃; for 2.5h;51.7%
Dichloromethylsilane
75-54-7

Dichloromethylsilane

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

acetic anhydride
108-24-7

acetic anhydride

C18H38O9Si4

C18H38O9Si4

Conditions
ConditionsYield
Stage #1: Dichloromethylsilane; tetramethyldivinyldisiloxane With dihydrogen hexachloroplatinate In isopropyl alcohol for 0.833333h; Inert atmosphere;
Stage #2: acetic anhydride at 100℃; for 12h; Inert atmosphere;
94%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

acetic anhydride
108-24-7

acetic anhydride

C20H38O13Si4

C20H38O13Si4

Conditions
ConditionsYield
Stage #1: tetramethyldivinyldisiloxane With dihydrogen hexachloroplatinate; trichlorosilane In isopropyl alcohol for 0.833333h; Inert atmosphere;
Stage #2: acetic anhydride at 100℃; for 12h; Inert atmosphere;
94%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

(4-bromophenyl)(phenyl)methanone
90-90-4

(4-bromophenyl)(phenyl)methanone

4-vinylbenzophenone
3139-85-3

4-vinylbenzophenone

Conditions
ConditionsYield
With potassium trimethylsilonate; Triphenylphosphine oxide; palladium tris(dibenzylideneacetone) In tetrahydrofuran for 3h; Heating;93%
With tris-(dibenzylideneacetone)dipalladium(0); potassium trimethylsilonate; Triphenylphosphine oxide In tetrahydrofuran at 66℃; for 5h; Inert atmosphere;90%
4-vinylbenzyl chloride
1073-67-2

4-vinylbenzyl chloride

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,3-bis[(E)-4-chlorostyryl]tetramethyldisiloxane
1123168-01-3

1,3-bis[(E)-4-chlorostyryl]tetramethyldisiloxane

Conditions
ConditionsYield
Stage #1: 4-vinylbenzyl chloride; tetramethyldivinyldisiloxane With (carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II) In 1,4-dioxane at 100℃; for 0.0833333h; Inert atmosphere;
Stage #2: With copper(l) chloride In 1,4-dioxane at 100℃; for 16h; Inert atmosphere; stereoselective reaction;
93%
With (carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II); copper(l) chloride In 1,4-dioxane at 100℃; for 16h;
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

4-bromobenzocyclobutene
1073-39-8

4-bromobenzocyclobutene

1,2-bis(benzocyclobuten-4-yl)ethylene

1,2-bis(benzocyclobuten-4-yl)ethylene

Conditions
ConditionsYield
With tetrabutylammomium bromide; potassium acetate; palladium diacetate; tris-(o-tolyl)phosphine In water; N,N-dimethyl-formamide at 100℃; for 48h; Inert atmosphere;93%
rac-3-sulfanylpropane-1,2-diol
96-27-5

rac-3-sulfanylpropane-1,2-diol

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

C14H34O5S2Si2

C14H34O5S2Si2

Conditions
ConditionsYield
With 2,2-dimethoxy-2-phenylacetophenone In tetrahydrofuran at 20℃; for 2h; UV-irradiation;93%
tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

3-bromobicyclo[4.2.0]octa-1,3,5-trien-7-one

3-bromobicyclo[4.2.0]octa-1,3,5-trien-7-one

1,2-bis(benzocyclobutenon-4-yl)ethylene

1,2-bis(benzocyclobutenon-4-yl)ethylene

Conditions
ConditionsYield
With tetrabutylammomium bromide; potassium acetate; palladium diacetate; tris-(o-tolyl)phosphine In water; N,N-dimethyl-formamide at 100℃; for 48h; Inert atmosphere;92%
2-bromothiophene
1003-09-4

2-bromothiophene

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

Conditions
ConditionsYield
With tetrabutylammomium bromide; potassium acetate; palladium diacetate; tris-(o-tolyl)phosphine In water; N,N-dimethyl-formamide at 100℃; for 48h; Inert atmosphere;92%
3-bromoquinoline
5332-24-1

3-bromoquinoline

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

3-ethenylquinoline
67752-31-2

3-ethenylquinoline

Conditions
ConditionsYield
With potassium trimethylsilonate; Triphenylphosphine oxide; palladium tris(dibenzylideneacetone) In tetrahydrofuran for 3h; Heating;91%
1-bromo-4-ethenyl-benzene
2039-82-9

1-bromo-4-ethenyl-benzene

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

1,3-bis[(E)-4-bromostyryl]tetramethyldisiloxane
1123168-00-2

1,3-bis[(E)-4-bromostyryl]tetramethyldisiloxane

Conditions
ConditionsYield
Stage #1: 1-bromo-4-ethenyl-benzene; tetramethyldivinyldisiloxane With (carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II) In 1,4-dioxane at 100℃; for 0.0833333h; Inert atmosphere;
Stage #2: With copper(l) chloride In 1,4-dioxane at 100℃; for 16h; Inert atmosphere; stereoselective reaction;
91%
With (carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II); copper(l) chloride In 1,4-dioxane at 100℃; for 16h;
1-Heptyne
628-71-7

1-Heptyne

tetramethyldivinyldisiloxane
2627-95-4

tetramethyldivinyldisiloxane

A

1-(1-heptynyl)-1,1,3,3-tetramethyl-3-vinyldisiloxane
1267749-58-5

1-(1-heptynyl)-1,1,3,3-tetramethyl-3-vinyldisiloxane

B

C18H34OSi2
1267749-59-6

C18H34OSi2

Conditions
ConditionsYield
With carbonylchlorohydridobis(tricyclohexylphosphine)ruthenium(II) In toluene at 120℃; for 24h; Inert atmosphere;A 91%
B 8 %Chromat.

2627-95-4Relevant articles and documents

PROCESSES FOR SYNTHESIZING UNSYMMETRICAL DISILOXANES

-

Paragraph 0044-0046, (2021/06/22)

Described herein are methods for making alkenyl disiloxanes, comprising combining an alkenyl halosilane with an alkyl halosilane and adding the mixture to water, an acidic aqueous solution, or a basic aqueous solution. The ratio of the alkenyl halosilane to the alkyl halosilane is about 10:1 to about 1:10. The alkenyl halosilane and the alkyl halosilane are mixed at about 20 °C to about 45 °C. The reaction product is separated and washed with saturated alkali carbonate solution.

Preparation method of 1-vinyl-1,1,3,3,3-pentamethyldisiloxane

-

Paragraph 0039-0041, (2018/09/11)

The invention relates to a preparation method of 1-vinyl-1,1,3,3,3-pentamethyldisiloxane, prepared by: using 1,3-divinyl-1,1,3,3,-tetramethyldisiloxane ad 1,1,1,3,3,3-hexamethyldisiloxane as materials, carrying out rearrangement reaction under the catalytic action of a complexing catalyst KOH/18-crown ether-6; neutralizing the catalyst, filtering, and distilling filtrate. The macromolecular ring compound 18-crown ether-6 and KOH form the complexing agent; the compound reaction helps improve catalyst activity and efficiently catalyzes for rearrangement reaction. The macromolecular ring compound18-crown ether-6 and KOH form a complexing catalyst; complexing reaction is performed to obtain improved catalyst activity, and rearranging reaction is efficiently catalyzed. In addition, the preparation method is simple, the reacting is fast and stable, and the preparation method has the advantages of high yield, good safety, good environmental friendliness and the like.

Method for preparing 1,3-divinyl-1,1,3,3-tetramethyldisiloxane

-

Paragraph 0014; 0015; 0016-0019; 0020-0023; 0024-0027, (2018/06/26)

The invention discloses a method for preparing 1,3-divinyl-1,1,3,3-tetramethyldisiloxane. The method comprises the following step: 1,3-divinyl-1,1,3,3-tetramethyldisiloxane is prepared from 1,1,3,3-tetramethyldisiloxane, acetylene, cocatalyst amine compounds and a reaction system formed by a catalyst ruthenium compound through reaction. According to the preparation method, 1,1,3,3-tetramethyldisiloxane and acetylene can be subjected to reaction in one step under the mild condition for generation of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane. The method has the advantages of few side reactions,high yield of main products, lower cost and high safety, and is suitable for industrial production.

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