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281-15-2

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281-15-2 Usage

General Description

9-Thiabicyclo[3.3.1]nonane, also known as TBN, is a chemical compound with the molecular formula C7H12S. It is a bicyclic compound containing a sulfur atom in its ring structure. TBN is known for its use as a lubricant additive, where it improves the performance and durability of engine oils and other lubricants. It is also used as an antioxidant and corrosion inhibitor. TBN is considered to be a versatile additive in the automotive and industrial lubricant industry due to its ability to enhance the overall performance and longevity of the lubricants in which it is used.

Check Digit Verification of cas no

The CAS Registry Mumber 281-15-2 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 2,8 and 1 respectively; the second part has 2 digits, 1 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 281-15:
(5*2)+(4*8)+(3*1)+(2*1)+(1*5)=52
52 % 10 = 2
So 281-15-2 is a valid CAS Registry Number.

281-15-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name 9-thiabicyclo[3.3.1]nonane

1.2 Other means of identification

Product number -
Other names 9-Thiabicyclo<3.3.2>nonan

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:281-15-2 SDS

281-15-2Downstream Products

281-15-2Relevant articles and documents

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS

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Paragraph 0220-0221, (2020/02/22)

A photoacid generator having formula (1a) is provided. A chemically amplified resist composition comprising the PAG forms a pattern of rectangular profile with a good balance of sensitivity and LWR when processed by photolithography using ArF excimer lase

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