31820-06-1

Basic information

• Product Name: dimethylethylamine-N-oxide
• Synonyms: dimethylethylamine-N-oxide;N,N-Dimethylethanamine N-oxide;N,N-dimethylethanamine oxide
• CAS NO: 31820-06-1
• Molecular Formula: C₄H₁₁NO
• Molecular Weight: 89.14
• Mol File: 31820-06-1.mol

Chemical Properties

• Boiling Point: °Cat760mmHg
• Flash Point: °C
• Appearance: /
• Density: g/cm³
• PKA: 4.72±0.40(Predicted)
• CAS DataBase Reference: dimethylethylamine-N-oxide(CAS DataBase Reference)
• NIST Chemistry Reference: dimethylethylamine-N-oxide(31820-06-1)
• EPA Substance Registry System: dimethylethylamine-N-oxide(31820-06-1)

Safety Data

• Hazardous Substances Data: 31820-06-1(Hazardous Substances Data)

Usage

Uses

Used in Oil and Gas Production:
Dimethylethylamine-N-oxide is used as a stabilizer and corrosion inhibitor for enhancing the efficiency and longevity of oil and gas production processes. Its ability to prevent and inhibit metal corrosion contributes to the protection of infrastructure and equipment in this industry.
Used as a Solvent:
In the chemical industry, dimethylethylamine-N-oxide serves as a solvent for dyes, resins, and waxes. Its solubility properties make it an effective medium for dissolving and processing these substances, facilitating their application in various products and manufacturing processes.
Used in Emulsions and Disinfectants:
Dimethylethylamine-N-oxide is utilized as a stabilizer in emulsions and disinfectants, ensuring the uniform distribution of components and maintaining the effectiveness of these products over time. Its stabilizing properties are crucial for the performance and shelf life of emulsion-based and disinfectant products in various industries, including pharmaceuticals, cosmetics, and cleaning products.

InChI:InChI=1/C4H11NO/c1-4-5(2,3)6/h4H2,1-3H3

Upstream product

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Relevant articles and documents

Organometallic precursor for forming a tungsten thin film and a method of manufacturing the same

The present invention relates to an organometallic precursor for forming a tungsten thin film for improving material properties of a tungsten deposited film, and a method for manufacturing the same. The organometallic precursor according to the present invention is formed by replacing a CO ligand with a ligand containing nitrogen in a tungsten carbonyl compound.(AA) Start(BB) ENd(S10) Add a first ligand precursor(S20) Make a glass-metal precursor(S30) Add a second ligand precursorCOPYRIGHT KIPO 2020