338445-29-7

Usage

Uses

Used in Polymerization Reactions:
(4-phenylsulfanylphenyl)diphenylsulfonium nonafluorobutanesulfonate is used as a photoinitiator for promoting the initiation and propagation of polymerization reactions when exposed to light. This application is particularly relevant in the production of light-curable resins and coatings.
Used in Materials Science:
In the field of materials science, (4-phenylsulfanylphenyl)diphenylsulfonium nonafluorobutanesulfonate is used as a catalyst to facilitate light-activated polymerization processes, which are essential for the development of advanced materials with specific properties.
Used in Polymer Chemistry:
(4-phenylsulfanylphenyl)diphenylsulfonium nonafluorobutanesulfonate is also utilized in polymer chemistry as a photoinitiator to initiate polymerization reactions under light exposure, enabling the synthesis of polymers with tailored properties for various applications.
Used in Industrial Applications:
(4-phenylsulfanylphenyl)diphenylsulfonium nonafluorobutanesulfonate is employed in various industrial applications due to its stability and ability to act as a catalyst in light-induced polymerization processes, making it a valuable asset in the production of coatings, resins, and other materials with specific requirements.

Upstream product

• 375-73-5 perfluorobutanesulfonic acid 
• 139-66-2 diphenyl sulfide 
• 945-51-7 1,1'-sulfinylbisbenzene 
• 524678-36-2 diphenyl[4-(phenylthio)phenyl]-sulfonium bromide 
• 29420-49-3 potassium nonaflate 

Relevant academic research and scientific papers

METHOD OF MANUFACTURING SULTONIUM SALT

Provided is a sulfonium salt manufacturing method which can reduce the production of a monosulfonium salt. A method of manufacturing a sulfonium salt includes preparing a first sulfonium salt containing a sulfonium cation and a first anion, preparing a second sulfonium salt by exchanging the first anion for a halide ion, and preparing a third sulfonium salt by exchanging the halide ion for a second anion.

HYBRID ONIUM SALT

The present invention relates to a hybrid type onium salt having an iodonium salt and a sulfonium salt in the molecule, useful, for example, as a cationic type photopolymerization initiator and an acid generator for a chemically amplified resist and provi

Novel anthracene derivative and radiation-sensitive resin composition

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.