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supersilyl diphenyl thallane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

345607-79-6

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345607-79-6 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 345607-79-6 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 3,4,5,6,0 and 7 respectively; the second part has 2 digits, 7 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 345607-79:
(8*3)+(7*4)+(6*5)+(5*6)+(4*0)+(3*7)+(2*7)+(1*9)=156
156 % 10 = 6
So 345607-79-6 is a valid CAS Registry Number.

345607-79-6Downstream Products

345607-79-6Relevant academic research and scientific papers

R4*Tl3Cl and R6*Tl6Cl2 (R* =SitBu3) - The first compounds with larger clusters containing covalently linked thallium atoms

Wiberg, Nils,Blank, Thomas,Lerner, Hans-Wolfram,Fenske, Dieter,Linti, Gerald

, p. 1232 - 1235 (2001)

The largest Tl clusters to date with covalently linked Tl atoms are contained in the title compounds obtained from TlCl3 and two molar equivalents of NaSitBu3 in THF at -78°C. The structure of (SitBu3)6Tl6Cl2, which contains two Tl3Cl four-membered rings linked through the central Tl atoms and the Cl atoms, is depicted.

Supersilyltrielanes R*nEHal3-n, (E = Triel, R* = SitBu3): Syntheses, characterization, reactions, structures [1]

Wiberg, Nils,Amelunxen, Kerstin,Blank, Thomas,Lerner, Hans-Wolfram,Polborn, Kurt,N?th, Heinrich,Littger, Ralf,Rackl, Manfred,Schmidt-Amelunxen, Martin,Schwenk-Kircher, Holger,Warchold, Markus

, p. 634 - 651 (2007/10/03)

Water- and oxygen-sensitive compounds R*EHal2?D, R*EHal2 and R*2EHal (R* = SitBu3; E = B, Al, Ga, In, Tl; Hal = F, Cl, Br, I; D = OR2, NR3) have been synthesized by reaction of EHal3 with NaR* in the absence or presence of donors as well as by substitution of D, Hal or R* by other substituents, or by reaction of R*2E-ER*2 (E = Al, In) with I2, H2, AgF2 or HBr. Thermal decomposition of the compounds in solution or in the gas phase leads to elimination of D from R*EHal2?D, or of R*Hal from R*EHal2 and R*2EHal, respectively. The dihalides R*EHal2 act as Lewis acids with respect to donors OR2 or NR3 (formation of adducts R*EHal2?D), the monohalides R*2EHal as Lewis bases with respect to acceptors EHal3 (formation of R*2E+ EHal4-). Dehalogenations of R*2EHal and R*EHal2 with alkali metals or NaR* leads to compounds R*4E2 (E = Al, In, Tl), R*3E2? (E = Al, Ga), R*4E3? (E = Al, Ga), R*4E4 (E = Al, Ga), R*6Ga8, R*8In12, (R*2B-), R*2Al-, R*3Ga2-, R*4Ga3-, R*4Ga42-, R*4Tl3Cl, or R*6Tl6Cl2. The structures of R*BBr2?Py, R* AlBr2?NEtMe2, (R*AlClOBu)2, R*2BF as well as R*2ECl (E = B, Al, Ga, Tl) have been determined by X-ray structure analyses.

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