359414-76-9Relevant academic research and scientific papers
PHOTOSENSITIVE COMPOSITIONS
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Page 18, (2008/06/13)
Radiation sensitive compositions for use in producing a patterned image on a substrate comprise: e) a first photoacid generator (PAG) compound P1, which comprises one or more compounds of the structure (A); f) a second photoacid generator compound P2 which comprises one or more compounds of the structure (B); and g) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat; wherein said polymer comprises one or more polymers comprising the monomer unit (C); and h) a solvent (A) where RxM = (a) or (b) where R and R are each independently C1-C12 fluoroalkyl groups or together R and R are joined with the N to form a (F2C)yN ring where y = 4-12; R, R, and R are each independently selected from unsubstituted aryl, alkyl or alpha-ketomethyl groups and such groups substituted with an acid sensitive group, or Rand R together with the S atom form a cycloalkylsulfonium ring; R to R and R to-R are each independently selected from branched or linear alkyl, alkoxy, halogen, hydrogen, OCO2G, OCH2CO2G, or OG where G = an acid sensitive group; (B) where each R is independently selected from a linear, cyclic, or branched C1-C8 fluoroalkyl group, substituted or unsubstituted phenyl group, substituted or unsubstituted naphthalene group, C6-C12 cyclic or alicyclic hydrocarbon, or a linear, cyclic, or branched C1-C8 alkyl group; (C) wherein R is selected from H, C1-C4 lower alkyl, CN, or CH2CO2R; R and R are each independently selected from H, linear or branched C1-C4 alkyl, or halogen; R is H, or branched or linear C1-C4 alkyl; R is selected from substituted or unsubstituted phenyl, a substituted or unsubstituted linear, branched or cyclic C1-C20 alkyl, optionally containing an ether or ester group, a substituted or unsubstituted phenalalkylene or a substituted or unsubstituted C6-C20 cyclic alkylene; R and R are independently selected from H, linear or branched or cyclic C1-C14 alkyl, or C7-C14 alicyclic; R is selected from a C1-C14 branched linear or cyclic alkyl, substituted or unsubstituted phenyl, or C7-C14 alicyclic group.
