39061-32-0Relevant articles and documents
COMPOUND, RESIST COMPOSITION AND MANUFACTURING METHOD OF RESIST PATTERN
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Paragraph 0155, (2018/10/27)
PROBLEM TO BE SOLVED: To provide a salt and a resist composition capable of manufacturing a resist pattern with excellent pattern collapse margin (PCM). SOLUTION: A compound is expressed by a formula (I). [Q1 and Q2 are independently F or a perfluoroalkyl group of C1-6; Lb1 is a saturated hydrocarbon group of single bond or C1-24; Y is H, F or an alicyclic hydrocarbon group of C3-18; and A is a group expressed by a formula (I-A).] COPYRIGHT: (C)2015,JPO&INPIT