Welcome to LookChem.com Sign In|Join Free

CAS

  • or

4016-01-7

Post Buying Request

4016-01-7 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

4016-01-7 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 4016-01-7 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,0,1 and 6 respectively; the second part has 2 digits, 0 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 4016-01:
(6*4)+(5*0)+(4*1)+(3*6)+(2*0)+(1*1)=47
47 % 10 = 7
So 4016-01-7 is a valid CAS Registry Number.
InChI:InChI=1/C7H8O4S/c1-5-3-2-4-6(7(5)8)12(9,10)11/h2-4,8H,1H3,(H,9,10,11)

4016-01-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name 2-hydroxy-3-methylbenzenesulfonic acid

1.2 Other means of identification

Product number -
Other names 2-methyl-1-hydroxybenzene-6-sulfonic acid

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:4016-01-7 SDS

4016-01-7Upstream product

4016-01-7Downstream Products

4016-01-7Relevant articles and documents

Process for aryl-quinone and aryl-naphthoquinone diazide sulfonic acids

-

, (2008/06/13)

A process for the preparation of aryl-diazide-sulfonic acids by a series of sequential in-situ process steps. The process comprises the nitrosation of a hydroxyarylsulfonic acid; conversion of the nitroso-derivative to a sulfamate which is then diazotized to the diazide. Temperature and pH are maintained in predetermined ranges to maintain the reaction products in solution without the formation side-products or the need to isolate intermediates. The process of the invention is particularly useful in the preparation of light-sensitive materials such as naphthoquinonediazide sulfonic acids which are used in the preparation of photoresist compositions. The invention provides a high purity product at a high material efficiency, high equipment utilization, low effluent discharge, and reduced cost.

Aromatic Sulphonation. Part 91. The Sulphonation of Anisole, Phenol, Phenyl Methanesulphonate, Potassium Phenyl Sulphate, and a Series of Methyl-, Bromo-, and Chloro-substituted Anisoles and Phenols in Concentrated Aqueous Sulphuric Acid

Cerfontain, Hans,Lambrechts, Hans J. A.,Schaasberg-Nienhuis, Zwaan R. H.,Coombes, Robert G.,Hadjigeorgiou, Panicos,Tucker, Geoffrey

, p. 659 - 668 (2007/10/02)

The (homogeneous) sulphonation of a number of aromatic ethers and alcohols, viz. anisole (1), 3-methyl- (2), 4-methyl- (3), 2-bromo- (4), 4-bromo- (5), 2-chloro- (6), and 4-chloro-anisole (7), phenol (8), 2-methyl- (9), 3-methyl- (10), 4-methyl- (11), 4-bromo- (12), 2-chloro- (13), and 4-chloro-phenol (14), phenyl methanesulphonate (15), and potassium phenyl sulphate (16) in concentrated aqueous sulphuric acid at 25.0 deg C has been studied, and rates and isomer distributions have been determined.The sulphonation is first-order in the aromatic substrate, and from the rate measurements it is concluded that the species undergoing sulphonation in the phenyl ring is an unprotonated substrate species.In the lower acid concentrations the sulphonating entity is H3SO4(1+).With increasing sulphuric acid concentration there is a gradual change-over in the sulphonating entity from H3SO4(1+) to H2S2O7.The acid concentrations of equal rate contribution by the two entities for anisole and phenol are 87 and 90 +/- 1percent, respectively.Sulphonation on the oxygen atom (i.e., sulphation) does not occur.The o/p-ratios for (1) and (8) do not vary over the studied sulphuric acid range of 75-90percent H2SO4.Partial rate factors for the 2- and 4-position of (1) and (8) are reported.The very low partial rate factors for the 4-substitution of (1) and (8) and the observed extreme suppression and compression of the reactivities of the substrates (1)-(14) are ascribed to hydrogen bonding of the substrates with the acidic solvent species present.It is tentatively suggested that the relatively high contents of sulphonation ortho to -OR with anisole (36percent) and phenol (48percent) are due to specific complexation of the substrates with the sulphonating electrophile.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 4016-01-7