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4109-96-0

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4109-96-0 Usage

description

Dichlorosilane is a highly flammable, corrosive, and toxic gas at room temperature and atmospheric pressure. It causes severe bums on contact with eyes, skin, and mucous membranes. With water or moisture, it hydrolyzes rapidly to yield silica and silicon oxyhydride along with hydrochloric acid. It is shipped as a liquefied gas in low pressure cylinders at its vapor pressure of 9.1 psig (62.7 kPa) at 70°F (21.1 0q. It can form flammable mixtures with air and oxidizing agents.

Chemical Properties

Different sources of media describe the Chemical Properties of 4109-96-0 differently. You can refer to the following data:
1. Dichlorosilane, SiH2Cl2, is a colourless, toxic, flammable, corrosive liquid shipped at its vapour pressure of 9.1 psig (63 kPa) at 70°F (21°C). liquefied gas with pungent odor. Highly corrosive in humid conditions. Gas density is heavier than air. Dichlorosilane is a silicon precursor for epitaxial silicon, silicon germanium, silicon nitride, silicon oxide, silicon carbide and metal silicide thin films.
2. colourless gas

Grades available

Dichlorosilane is primarily sold in ultra-high-purity grades for use in the electronics industry. A typical specification usually quantifies the acceptable levels of hydrocarbons and metals. Gas purity guidelines have been developed and published by Semiconductor Equipment and Materials International and can be found in the book of Book of SEMI Standards.

Uses

Different sources of media describe the Uses of 4109-96-0 differently. You can refer to the following data:
1. Dichlorosilane is primarily used in the electronics industry for such applications as growth of epitaxial or polycrystalline silicon and chemical vapor deposition of silicon dioxide and silicon nitride. It is an outstanding material for epitaxial deposition. Its silicon content by weight is greater than either trichlorosilane or silicon tetrachloride. Dichlorosilane deposits silicon more efficiently and at lower temperatures than the other chlorosilanes in epitaxial reactors. Dichlorosilane significantly lowers the processing time from that required with silane for deposi- tion of thick layers at reduced temperatures. The deposition rate of dichlorosilane does not vary appreciably with minor temperature changes inside the reactor, therefore substantially lowering the rejection rate by reducing variations in layer thickness and degree of taper. Since the deposition rate of dichlorosilane is not as temperature sensitive as that of other chlorosilanes, the rate is controlled by adjusting the dichlorosilane concentration in the hydrogen feedstream.
2. Dichlorosilane is primarily used in the electronics industry for such applications as growth of epitaxial or polycrystalline silicon and chemical vapor deposition of silicon dioxide and silicon nitride.

Preparation

Dichlorosilane is most commonly produced by the disproportionation of trichlorosilane in a catalytic redistribution reactor. The trichlorosilane is initially produced from metallurgical silicon that is reacted with hydrogen and silicon tetrachloride.

Physiological Effects

Dichlorosilane hydrolyzes and oxidizes readily to release hydrogen chloride; therefore, the symptoms, effects, and treatment will be similar to those for hydrogen chloride. Dichlorosilane will cause severe bums on contact with eyes, skin, and mucous membranes. If dichlorosilane is inhaled, immediately remove the victim to fresh air. If breathing is dif- ficult, give oxygen. Prompt treatment by a physician is required even if no symptoms of exposure are evident since the symptoms may be delayed. Inhalation of low concentrations of vapors will cause irritation of the respiratory tract, producing cough, excess sputum, and chest discomfort. Inhalation of vapors can cause severe irritation or bums of moist skin, mucous membranes, and the upper respiratory tract, as well as delayed pulmonary edema. Chronic exposure to the vapors may cause discoloration or erosion of the teeth, bleeding of nose and gums, and ulceration of the nasal mucosa. Vapor contact with the eye will cause severe irritation experienced as pain in the eye, excess lachrymation, closure of the eyelids, and marked excess redness and swelling of the conjunctive. If high concentrations of hydrogen chloride vapor are formed, then corneal injury can occur. Splash contamination may cause severe conjunctivitis seen as marked excess redness and swelling of the conjunctive, discharge, iritis, and severe corneal injury. The corneal injury, if untreated, could result in permanent blindness.

Disposal

Dichlorosilane should not be discharged directly into surface waters or sewer systems since an acidic waste product is formed. The disposal can be accomplished by controlled introduction of the product into water. The exothermic reactions of dichlorosilane with water (hydrolysis) result in the formation of hydrochloric acid and an insoluble silicon containing solid or fluid. In order to prevent air pollution, the quantity of water must be sufticient to dissolve all of the hydrogen chloride that will be formed. The ratio of water to dichlorosilane should be at least 10 to 1. The corrosive and exothermic nature of the reaction should be considered in selecting materials of construction for the equipment used in this procedure. The hydrochloric acid formed should then be neutralized with an alkali agent such as aqueous ammonia, sodium hydroxide, lime slurry, etc., and should be added as an aqueous solution with agitation to the acidic medium. Consideration must be given to the additional heat that will be produced by the neutralization. Silicon-containing solids should be washed to remove residual acid. Discard any product, residue, disposable container, or liner in an environmentally acceptable manner. Disposal of dichlorosilane by neutralizing, scrubbing, incineration, or by other means, may be subject to permitting by federal, state or provincial regulations. Persons involved with disposal of dichiorosilane should check with the environmental authorities having jurisdiction to determine the applicability of permitting regulations to disposal activities.

Description

Dichlorosilane is a highly flammable, corrosive, and toxic gas at room temperature and atmospheric pressure. It causes severe bums on contact with eyes, skin, and mucous membranes. With water or moisture, it hydrolyzes rapidly to yield silica and silicon oxyhydride along with hydrochloric acid. It is shipped as a liquefied gas in low pressure cylinders at its vapor pressure of 9.1 psig (62.7 kPa) at 70°F (21.1℃. It can form flammable mixtures with air and oxidizing agents.

Application

Gives improved yields in reduction of imines over that of trichlorosilane.Easier to handle form of dichlorosilane.

General Description

Dichlorosilane is a flammable and poisonous gas, with a strong repulsive odor. Dichlorosilane is easily ignited in air, reacts with oxidizing agents, is very toxic by inhalation, and is a strong irritant to skin, eyes and mucous membranes. Under prolonged exposure to fire or intense heat the container may rupture violently or rocket.

Air & Water Reactions

Highly flammable. Based on the properties of similar materials, there is the possibility that the reaction of Dichlorosilane with water may be vigorous or violent. Products of the reaction include hydrogen chloride. The reaction generates heat and this heat may be sufficient to ignite the product. The chlorosilicon hydrides(ClxSiHy) are spontaneously flammable in air, NFPA 1991.

Reactivity Profile

Chlorosilanes, such as Dichlorosilane, are compounds in which silicon is bonded to from one to four chlorine atoms with other bonds to hydrogen and/or alkyl groups. Chlorosilanes react with water, moist air, or steam to produce heat and toxic, corrosive fumes of hydrogen chloride. They may also produce flammable gaseous H2. They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases.

Hazard

Dichlorosilane is toxic by inhalation and skin absorption. Hydrogen chloride causes severe eye and skin burns and is irritating to the skin, eyes, and respiratory system. The four-digit UN identification number is 2189. The NFPA 704 designation is health 4, flammability 4, and reactivity 2. The white area at the bottom of the diamond contains a W with a slash through it, indicating water reactivity.

Health Hazard

TOXIC; may be fatal if inhaled or absorbed through skin. Contact with gas or liquefied gas may cause burns, severe injury and/or frostbite. Fire will produce irritating, corrosive and/or toxic gases. Runoff from fire control may cause pollution.

Fire Hazard

Flammable; may be ignited by heat, sparks or flames. May form explosive mixtures with air. Vapors from liquefied gas are initially heavier than air and spread along ground. Vapors may travel to source of ignition and flash back. Some of these materials may react violently with water. Cylinders exposed to fire may vent and release toxic and flammable gas through pressure relief devices. Containers may explode when heated. Ruptured cylinders may rocket. Runoff may create fire or explosion hazard.

Flammability and Explosibility

Extremelyflammableliquifiedgas

Materials Uses

Dichlorosilane, in the complete absence of water, can be safely stored in mild steel equipment. In the presence of even small traces of water, dichlorosilane becomes extremely corrosive since the Si-CI bonds react rapidly with water, generating hydrogen chloride.br/> Because of reactivity with water, dichlorosilane should always be handled in dry equipment with a dry inert gas such as nitrogen. For transfer service, dry inert gas is preferred to pumping. Some examples of other common compatible materials used include: Viton, Teflon, Kel-F, nickel, Monel, and some types of stainless steel.

Safety Profile

Moderately toxic by inhalation. Ignites spontaneously in air. Confined mixtures with air are spontaneously explosive. When heated to decomposition it emits toxic fumes of Cl-. See also CHLOROSILANES.

Physiological effects

Dichlorosilane hydrolyzes and oxidizes readily to release hydrogen chloride; therefore, the symptoms, effects, and treatment will be similar to those for hydrogen chloride. Dichlorosilane will cause severe bums on contact with eyes, skin, and mucous membranes. If dichlorosilane is inhaled, immediately remove the victim to fresh air. If breathing is difficult, give oxygen. Prompt treatment by a physician is required even if no symptoms of exposure are evident since the symptoms may be delayed.

storage

Since dichlorosilane is a highly flammable, corrosive, and toxic liquefied gas, appropriate precautions must be taken in its storage and handling. During the handling of chlorosilanes, the use of such protective equipment as goggles, neoprene or natural rubber gloves, and protective clothing is essential. SCBAs, as well as both safety showers and eyewash fountains, should be available for emergency use. Cylinders should be assigned a definite area for storage. The area should be dry, cool, well ventilated, fire resistant, and away from ignition sources. Keep cylinders protected from excessive temperature rise by storing them away from radiators or other heat sources. Storage conditions should comply with local and state regulations. Cylinders may be stored in the open, but must be protected against extremes of weather and from the dampness of the ground to prevent rusting. During the summer, cylinders stored in the open should be shaded against the continuous direct rays of the sun in those localities where extreme temperatures prevail.

Waste Disposal

Dichlorosilane should not be discharged directly into surface waters or sewer systems since an acidic waste product is formed. The disposal can be accomplished by controlled introduction of the product into water. The exothermic reactions of dichlorosilane with water (hydrolysis) result in the formation of hydrochloric acid and an insoluble silicon containing solid or fluid. In order to prevent air pollution, the quantity of water must be sufticient to dissolve all of the hydrogen chloride that will be formed. The ratio of water to dichlorosilane should be at least 10 to 1. The corrosive and exothermic nature of the reaction should be t;onsidered in selecting materials of construction for the equipment used in this procedure. The hydrochloric acid formed should then be neutralized with an alkali agent such as aqueous ammonia, sodium hydroxide, lime slurry, etc., and should be added as an aqueous solution with agitation to the acidic medium. Consideration must be given to the additional heat that will be produced by the neutralization. Silicon-containing solids should be washed to remove residual acid. Discard any product, residue, disposable container, or liner in an environmentally acceptable manner. Disposal of dichlorosilane by neutralizing, scrubbing, incineration, or by other means, may be subject to permitting by federal, state or provincial regulations. Persons involved with disposal of dichiorosilane should check with the environmental authorities having jurisdiction to determine the applicability of permitting regulations to disposal activities.

GRADES AVAILABLE

Dichlorosilane is primarily sold in ultra- high-purity grades for use in the electronics industry. A typical specification usually quantifies the acceptable levels of hydrocarbons and metals. Gas purity guidelines have been developed and published by Semiconductor Equipment and Materials International and can be found in the book of Book ofSEMI Standards [1].

Check Digit Verification of cas no

The CAS Registry Mumber 4109-96-0 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,1,0 and 9 respectively; the second part has 2 digits, 9 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 4109-96:
(6*4)+(5*1)+(4*0)+(3*9)+(2*9)+(1*6)=80
80 % 10 = 0
So 4109-96-0 is a valid CAS Registry Number.
InChI:InChI=1/Cl2Si/c1-3-2

4109-96-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name dichlorosilicon

1.2 Other means of identification

Product number -
Other names dichloromonosilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Intermediates
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:4109-96-0 SDS

4109-96-0Synthetic route

hydrogenchloride
7647-01-0

hydrogenchloride

monosilane
7440-21-3

monosilane

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) reaction at 100 °C for a longer period of time;;79%
In neat (no solvent) reaction at 100 °C for a longer period of time;;79%
(4-methylphenyl)silane
931-70-4

(4-methylphenyl)silane

A

HSiCl2-p-CH3C6H4
13272-80-5

HSiCl2-p-CH3C6H4

B

Dichlorosilane
4109-96-0

Dichlorosilane

C

monochloro(p-tolyl)silane

monochloro(p-tolyl)silane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 60℃; for 19h; Temperature;A 5%
B 17%
C 76%
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 16 %Spectr.
B 36 %Spectr.
C 40 %Spectr.
hydrogenchloride
7647-01-0

hydrogenchloride

monosilane
7440-21-3

monosilane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In diethyl ether at 60℃; for 20h;A 73%
B 27%
In diethyl ether at 80℃; for 42h;A 34%
B 66%
(2,4,6-trimethylphenyl)silane
120578-34-9

(2,4,6-trimethylphenyl)silane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 80℃; for 15h; Solvent; Temperature;A 64%
B 36%
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; for 15h; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 64 %Spectr.
B 36 %Spectr.
allylsilane
18191-59-8

allylsilane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With hydrogenchloride In diethyl ether at 60℃; for 20h;A 42%
B 13%
With hydrogenchloride In diethyl ether at 80℃; for 42h;A 20%
B 33%
With hydrogenchloride; diethyl ether In benzene-d6 at 60℃; for 20h; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 42 %Spectr.
B 13 %Spectr.
With hydrogenchloride; diethyl ether In benzene-d6 at 80℃; Reagent/catalyst; Schlenk technique; Inert atmosphere;A 20 %Spectr.
B 33 %Spectr.
trichlorosilane
10025-78-2

trichlorosilane

hydrogen
1333-74-0

hydrogen

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With aluminium In neat (no solvent) passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;; separation by fractionated distillation;;A 1-2
B 15%
With Al In neat (no solvent) passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;; separation by fractionated distillation;;A 1-2
B 15%
trichlorosilane
10025-78-2

trichlorosilane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

diphenylsilyl dichloride
80-10-4

diphenylsilyl dichloride

A

Dichlorosilane
4109-96-0

Dichlorosilane

B

Phenyltrichlorosilane
98-13-5

Phenyltrichlorosilane

Conditions
ConditionsYield
With hydrogenchloride; trichlorosilane; aluminium chloride
With trichlorosilane; aluminium chloride
With trichlorosilane; aluminium chloride
dibromochlorosilane
82146-27-8

dibromochlorosilane

trimethylstannane
1631-73-8

trimethylstannane

A

dibromosilane
13768-94-0

dibromosilane

B

chlorosilane
13966-57-9

chlorosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) condensing of equimolar amts. of tinhydride and SiClHBr2 (trace of SiCl2HBr present) into cold finger, reaction at room temp. (30 min); further products; not isolated; IR spectroscopy;A 0%
B n/a
C 0%
trichlorosilane
10025-78-2

trichlorosilane

trimethylstannane
1631-73-8

trimethylstannane

A

trimethyltin(IV)chloride
1066-45-1

trimethyltin(IV)chloride

B

monosilane
7440-21-3

monosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 12 h; not isolated; IR spectroscopy (identified 41% SiCl2H2 and 15% SiH4 in product mixt.);
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

trimethylstannane
1631-73-8

trimethylstannane

A

trichlorosilane
10025-78-2

trichlorosilane

B

trimethyltin(IV)chloride
1066-45-1

trimethyltin(IV)chloride

C

monosilane
7440-21-3

monosilane

D

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 36 h; not isolated; IR spectroscopy (identified 25-30% SiCl3H, 15% SiCl2H2 and 10% SiH4 in product mixt.);
calcium hydride
7789-78-8

calcium hydride

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

A

trichlorosilane
10025-78-2

trichlorosilane

B

chlorosilane
13966-57-9

chlorosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;A n/a
B 0%
C 0%
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;A n/a
B 0%
C 0%
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

monosilane
7440-21-3

monosilane

A

trichlorosilane
10025-78-2

trichlorosilane

B

chlorosilane
13966-57-9

chlorosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In gas reactor temp.: 250 - 500°C; detn. by gas chromy.;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hydrogen
1333-74-0

hydrogen

A

aluminium trichloride
7446-70-0

aluminium trichloride

B

trichlorosilane
10025-78-2

trichlorosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With aluminium In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;
With Al In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hydrogen
1333-74-0

hydrogen

A

trichlorosilane
10025-78-2

trichlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With co-catalyst: pyrimidine or P(OPh)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tri-n-butyl-tin hydride In acetonitrile absence of air; H2-stream; gas chromy.;
With Al or Mg or Zn In neat (no solvent, gas phase) passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;
With Al or Mg or Zn In gas passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hydrogen
1333-74-0

hydrogen

A

trichlorosilane
10025-78-2

trichlorosilane

B

monosilane
7440-21-3

monosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With co-catalyst: P(O(i)Pr)3 or PMe2Ph or PPh3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hydrogen
1333-74-0

hydrogen

A

trichlorosilane
10025-78-2

trichlorosilane

B

chlorosilane
13966-57-9

chlorosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With co-catalyst: P(OMe)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tin(IV) chloride
7646-78-8

tin(IV) chloride

monosilane
7440-21-3

monosilane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In not given chlorination with SnCl4 leads to SiH3Cl at room temp.; no SnH2Cl2 formed;;A n/a
B 0%
hydrogenchloride
7647-01-0

hydrogenchloride

monosilane
7440-21-3

monosilane

A

disilane

disilane

B

trichlorosilane
10025-78-2

trichlorosilane

C

chlorosilane
13966-57-9

chlorosilane

D

hydrogen
1333-74-0

hydrogen

E

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In gas Kinetics; Irradiation (UV/VIS); infrared laser irrdn. of SiH4-HCl mixt. in pressure range of 28-60 torrand in temp. range of 295-414 K; analyzed by mass spectrometry;
Dichloromethylsilane
75-54-7

Dichloromethylsilane

A

trichlorosilane
10025-78-2

trichlorosilane

B

chlorosilane
13966-57-9

chlorosilane

C

monosilane
7440-21-3

monosilane

D

Dichlorosilane
4109-96-0

Dichlorosilane

E

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
With AlCl3 In neat (no solvent) (CH3)SiHCl2 and AlCl3 at 325°C under pressure; further products;;
With AlCl3 In neat (no solvent) (CH3)SiHCl2 and AlCl3 at 325°C under pressure; further products;;
hydrogenchloride
7647-01-0

hydrogenchloride

silicon
7440-21-3

silicon

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) reaction at rather low temperature;;
In neat (no solvent) heating of amorphous Si with HCl;;
In neat (no solvent) reaction at rather low temperature;;
In neat (no solvent) heating of amorphous Si with HCl;;
Dimethyl ether
115-10-6

Dimethyl ether

silicon
7440-21-3

silicon

A

Methyltrichlorosilane
75-79-6

Methyltrichlorosilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

trichlorosilane
10025-78-2

trichlorosilane

D

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With hydrogenchloride; copper In neat (no solvent) Si-Cu (9:1) and a mixt. of CH3OCH3 and HCl (2:1) at 325°C;;
calcium hydride
7789-78-8

calcium hydride

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

A

chlorosilane
13966-57-9

chlorosilane

B

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent) passing SiCl4 vapor over heated CaH2;;A 0%
B 0%
In neat (no solvent) passing SiCl4 vapor over heated CaH2;;A 0%
B 0%
trichlorosilane
10025-78-2

trichlorosilane

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With catalyst: anion exchange resin In gas Kinetics; byproducts: SiCl4; mixt. of Ar and SiHCl3 is passed over the catalyst (anion exchange resins AV17-12P with active group -N(+)Me3, AV27-10P with active group -N(+)Me2C2H5O, AN18-12P with active group -N(+)HMe2) at 388 K; react. is monitored by chromy.;
trichlorosilane
10025-78-2

trichlorosilane

A

chlorosilane
13966-57-9

chlorosilane

B

monosilane
7440-21-3

monosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With hydrogen; aluminium In neat (no solvent) byproducts: AlCl3; passing a mixture of SiHCl3 and H2 (1:2) over Al at 350 °C;;
trichlorosilane
10025-78-2

trichlorosilane

hydrogen
1333-74-0

hydrogen

A

chlorosilane
13966-57-9

chlorosilane

B

monosilane
7440-21-3

monosilane

C

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In neat (no solvent, gas phase)
In gas
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

magnesium hydride

magnesium hydride

A

trichlorosilane
10025-78-2

trichlorosilane

B

chlorosilane
13966-57-9

chlorosilane

C

monosilane
7440-21-3

monosilane

D

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In tetrahydrofuran-d8 MgH2 and clorosilane (1.10:0.66 molar ratio) sealed under Ar; stored for 3 d at room temp., NMR;
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

hydrogen
1333-74-0

hydrogen

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
With aluminium In neat (no solvent) passing a mixture of SiCl4 and H2 over Al at 400 °C;;3-5
With Al In neat (no solvent) passing a mixture of SiCl4 and H2 over Al at 400 °C;;3-5
chlorine
7782-50-5

chlorine

silacarbene
7440-21-3

silacarbene

Dichlorosilane
4109-96-0

Dichlorosilane

Conditions
ConditionsYield
In gas Kinetics; helium buffer gas (total pressure 5 Torr), ambient temp.; high-resolution transient absorption spectroscopy (SiH2);
Dichlorosilane
4109-96-0

Dichlorosilane

silicon
7440-21-3

silicon

Conditions
ConditionsYield
Prepd. by laser chemical vapor pptn. at atmospheric pressure.;100%
In neat (no solvent) chemical vapor deposition with a mixt. of SiH2Cl2 and H2;
With hydrogen chemical vapor deposition (hot-wall reactor, basic pressure 10 or 76 Torr, 1223 K);
ammonia
7664-41-7

ammonia

Dichlorosilane
4109-96-0

Dichlorosilane

silicon nitride

silicon nitride

Conditions
ConditionsYield
Prepd. by laser chemical vapor pptn. at atmospheric pressure.;100%
In neat (no solvent) Kinetics; under Ar, in a low-pressure flow reactor at various condns.;
low pressure chemical vapor deposition at 820 °C;
chloroplatinic acid

chloroplatinic acid

Dichlorosilane
4109-96-0

Dichlorosilane

1,7-Octadiene
3710-30-3

1,7-Octadiene

A

bis(octenyl)dichlorosilane

bis(octenyl)dichlorosilane

B

bis(8-trimethylsilyloctyl)dimethylsilane

bis(8-trimethylsilyloctyl)dimethylsilane

Conditions
ConditionsYield
In isopropyl alcoholA 90%
B n/a
Dichlorosilane
4109-96-0

Dichlorosilane

tris(trimethylsilyl)silyl potassium

tris(trimethylsilyl)silyl potassium

C9H29ClSi5
134648-78-5

C9H29ClSi5

Conditions
ConditionsYield
In toluene at -78℃; for 23h; Inert atmosphere;90%
n-propylmagnesium bromide
927-77-5

n-propylmagnesium bromide

Dichlorosilane
4109-96-0

Dichlorosilane

dipropylsilane
871-77-2

dipropylsilane

Conditions
ConditionsYield
In diethyl ether H2SiCl2 and n-C3H7MgBr in ether; acidic hydrolysis;;88%
In diethyl ether H2SiCl2 and n-C3H7MgBr in ether; acidic hydrolysis;;88%
Cp(PMe3)2RuH
90413-24-4

Cp(PMe3)2RuH

Dichlorosilane
4109-96-0

Dichlorosilane

A

RuCp(PMe3)SiH2Cl
222175-87-3

RuCp(PMe3)SiH2Cl

B

[Cp(PMe3)2RuH2]Cl
160158-78-1

[Cp(PMe3)2RuH2]Cl

Conditions
ConditionsYield
In diethyl ether Ar-atmosphere; -78°C; filtering, evapn.; elem. anal.;A 81%
B n/a
antimony(III) fluoride
7783-56-4

antimony(III) fluoride

Dichlorosilane
4109-96-0

Dichlorosilane

A

difluorosilane
13824-36-7

difluorosilane

B

trifluorosilane
13465-71-9

trifluorosilane

C

silicon tetrafluoride
7783-61-1

silicon tetrafluoride

Conditions
ConditionsYield
In neat (no solvent) byproducts: H2; reaction in presence of SbCl5 at room temperature;;A 80%
B n/a
C 10%
antimony(III) fluoride
7783-56-4

antimony(III) fluoride

Dichlorosilane
4109-96-0

Dichlorosilane

A

difluorosilane
13824-36-7

difluorosilane

B

hydrogen
1333-74-0

hydrogen

C

trifluorosilane
13465-71-9

trifluorosilane

D

silicon tetrafluoride
7783-61-1

silicon tetrafluoride

Conditions
ConditionsYield
In neat (no solvent) fluorination of SiH2Cl2 with SbF3 at room temp. for a longer period of time;;A 80%
B n/a
C n/a
D n/a
Dichlorosilane
4109-96-0

Dichlorosilane

cyclohexylmagnesium bromide
931-50-0

cyclohexylmagnesium bromide

dicyclohexylsilane
15493-30-8

dicyclohexylsilane

Conditions
ConditionsYield
In not given79%
In not given79%
Dichlorosilane
4109-96-0

Dichlorosilane

diphenylsilane
775-12-2

diphenylsilane

Conditions
ConditionsYield
With C6H5MgBr In not given77%
With C6H5MgBr In not given77%
Dichlorosilane
4109-96-0

Dichlorosilane

lithium iodide

lithium iodide

diiodosilane
13760-02-6

diiodosilane

Conditions
ConditionsYield
In pentane at -70 - 35℃; for 16h; Temperature; Solvent; Inert atmosphere; Large scale;77%
at 40℃; under 1277.21 - 2311.54 Torr; for 0.08h; Temperature;45.3 g
Dichlorosilane
4109-96-0

Dichlorosilane

N,N,N',N'-tetramethylguanidine
80-70-6

N,N,N',N'-tetramethylguanidine

C12H30N6Si

C12H30N6Si

Conditions
ConditionsYield
In hexane at -78 - 20℃; Inert atmosphere;76%
1-hexene
592-41-6

1-hexene

Dichlorosilane
4109-96-0

Dichlorosilane

1,1-dichloro-1-silaheptane
871-64-7

1,1-dichloro-1-silaheptane

Conditions
ConditionsYield
chloroplatinic acid72%
Dichlorosilane
4109-96-0

Dichlorosilane

silicon nitride

silicon nitride

Conditions
ConditionsYield
With ammonia In dichloromethane byproducts: NH4Cl, H2; the silazane product formed in react. of SiH2Cl2 and gaseous NH3 in solvent, the product heated to 200°C for 1h under Ar then pyrolized at 1150°C for 12 under N2, Si formed only in traces;70%
ammonia
7664-41-7

ammonia

Dichlorosilane
4109-96-0

Dichlorosilane

silicon nitride

silicon nitride

Conditions
ConditionsYield
In diethyl ether byproducts: NH4Cl, H2; the silazane product formed in react. of SiH2Cl2 and gaseous NH3 in solvent, the product heated to 200°C for 1h under Ar then pyrolized at 1150°C for 12 under N2, Si formed only in traces;70%
Na2[nido-dodecahydrodecaborate(2-)]

Na2[nido-dodecahydrodecaborate(2-)]

Dichlorosilane
4109-96-0

Dichlorosilane

Na(7-H-7-SiB10H12)

Na(7-H-7-SiB10H12)

Conditions
ConditionsYield
In diethyl ether byproducts: NaCl, B10H14; condensation of Et2O into borane at -196°C, then condensation of excess of Si-compd. at -196°C, stirring and warming to room temp.overnight; solvent removal (vac.), washing (i-Pr2O), extn. into THF, filtration, evapn. (vac.);70%
Dichlorosilane
4109-96-0

Dichlorosilane

2.6-dimethylpiperidine
504-03-0

2.6-dimethylpiperidine

2,6-dimethylpiperidinochlorosilane
1427523-48-5

2,6-dimethylpiperidinochlorosilane

Conditions
ConditionsYield
With triethylamine In hexane at -20℃;66%
1,4-di-tert-butyl-1,4-diazabutadiene
28227-42-1, 30834-74-3

1,4-di-tert-butyl-1,4-diazabutadiene

Dichlorosilane
4109-96-0

Dichlorosilane

1,3-Di-tert-butyl-2,3-dihydro-1H-[1,3,2]diazasilole

1,3-Di-tert-butyl-2,3-dihydro-1H-[1,3,2]diazasilole

Conditions
ConditionsYield
Stage #1: 1,4-di-tert-butyl-1,4-diazabutadiene With lithium In tetrahydrofuran at 0 - 20℃; for 4h;
Stage #2: Dichlorosilane In tetrahydrofuran; toluene at -20 - 20℃; for 6h;
65%
1-dodecene
112-41-4

1-dodecene

Dichlorosilane
4109-96-0

Dichlorosilane

di-n-dodecyldichlorosilane
18768-06-4

di-n-dodecyldichlorosilane

Conditions
ConditionsYield
Stage #1: 1-dodecene; Dichlorosilane at -78 - 0℃; Inert atmosphere;
Stage #2: dihydrogen hexachloroplatinate(IV) hexahydrate In isopropyl alcohol at 0 - 20℃; Inert atmosphere;
62.5%
isopropylmagnesium bromide
920-39-8

isopropylmagnesium bromide

Dichlorosilane
4109-96-0

Dichlorosilane

di-isopropylsilane
18209-66-0

di-isopropylsilane

Conditions
ConditionsYield
In diethyl ether H2SiCl2 and i-C3H7MgBr in ether; acidic hydrolysis;;60%
In diethyl ether H2SiCl2 and i-C3H7MgBr in ether; acidic hydrolysis;;60%
Na(1+)*{((CH3)3Si)(CH3)C2B4H5}(1-)=Na{((CH3)3Si)(CH3)C2B4H5}

Na(1+)*{((CH3)3Si)(CH3)C2B4H5}(1-)=Na{((CH3)3Si)(CH3)C2B4H5}

Dichlorosilane
4109-96-0

Dichlorosilane

A

{((CH3)3Si)(CH3)C2B4H4}Si
109065-43-2

{((CH3)3Si)(CH3)C2B4H4}Si

B

{((CH3)3Si)(CH3)C2H4B4}SiHCl
109122-66-9

{((CH3)3Si)(CH3)C2H4B4}SiHCl

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran addn. of a THF-soln. of 10.08mmol carborane to a soln. of 10.50mmol n-BuLi in THF in vac., react. with SiCl2H2 at -23°C for 2h, removal of THF in vac. at 0°C;; distn. at 0°C; elem. anal.; detn. by MS, IR, (1)H-, (11)B-, (13)C-, (29)Si-NMR;;A n/a
B 58%
Dichlorosilane
4109-96-0

Dichlorosilane

zinc(II) carbonate
743369-26-8

zinc(II) carbonate

1,1,3,3,5,5,7,7,9,9,11,11-dodecahydro-cyclohexasiloxane
295-01-2

1,1,3,3,5,5,7,7,9,9,11,11-dodecahydro-cyclohexasiloxane

Conditions
ConditionsYield
In hexane Cooling;57.6%
fac-(CO)3(2,2'-bipyridine)W(NCEt)
135814-32-3, 158513-30-5

fac-(CO)3(2,2'-bipyridine)W(NCEt)

Dichlorosilane
4109-96-0

Dichlorosilane

fac-(CO)3(2,2'-bipyridine)W(H)(Cl)
135848-51-0

fac-(CO)3(2,2'-bipyridine)W(H)(Cl)

Conditions
ConditionsYield
In dichloromethane N2; 1 equivalent; 10 min;; concd.; filtered; washed with cold CH2Cl2; recrystd. from acetone; elem. anal.;;54%
Dichlorosilane
4109-96-0

Dichlorosilane

Cl2H32O15Si16

Cl2H32O15Si16

Conditions
ConditionsYield
In water at -40 - 20℃; for 1.5h; Inert atmosphere;51%
o-Xylylene dichloride
612-12-4

o-Xylylene dichloride

Dichlorosilane
4109-96-0

Dichlorosilane

1-chloromethyl-2-(trichlorosilylmethyl)benzene
36147-65-6

1-chloromethyl-2-(trichlorosilylmethyl)benzene

Conditions
ConditionsYield
triphenylphosphine In benzene50%
(chloromethyl)triisopropoxysilane
18162-82-8

(chloromethyl)triisopropoxysilane

Dichlorosilane
4109-96-0

Dichlorosilane

1,1,1,5,5,5-hexaisopropoxy-1,3,5-trisilapentane
1469432-28-7

1,1,1,5,5,5-hexaisopropoxy-1,3,5-trisilapentane

Conditions
ConditionsYield
Stage #1: (chloromethyl)triisopropoxysilane With magnesium; ethylene dibromide In tetrahydrofuran at 25 - 35℃; for 8.5h;
Stage #2: Dichlorosilane In tetrahydrofuran; n-heptane at 40 - 50℃; for 7h;
50%

4109-96-0Relevant articles and documents

SYNTHESIS OF ORGANO CHLOROSILANES FROM ORGANOSILANES

-

Page/Page column 36; 37, (2019/04/16)

The invention relates to a process for the production of chlorosilanes by subjecting one or more hydndosilanes to the reaction with hydrogen chloride in the presence of at least one ether compound, and a process for the production of such hydndosilanes serving as starting materials.

Amorphous silicon: New insights into an old material

Spomer, Natalie,Holl, Sven,Zherlitsyna, Larissa,Maysamy, Fariba,Frost, Andreas,Auner, Norbert

, p. 5600 - 5616 (2015/03/30)

Amorphous silicon is synthesized by treating the tetrahalosilanes SiX4 (X=Cl, F) with molten sodium in high boiling polar and non-polar solvents such as diglyme or nonane to give a brown or a black solid showing different reactivities towards suitable reagents. With regards to their technical relevance, their stability towards oxygen, air, moisture, chlorine-containing reaction partners RCl (R=H, Cl, Me) and alcohols is investigated. In particular, reactions with methanol are a versatile tool to deliver important products. Besides tetramethoxysilane formation, methanolysis of silicon releases hydrogen gas under ambient conditions and is thus suitable for a decentralized hydrogen production; competitive insertion into the MeO-H versus the Me-OH bond either yields H- and/or methyl-substituted methoxy functional silanes. Moreover, compounds, such as MenSi(OMe)4-n (n=0-3) are simply accessible in more than 75% yield from thermolysis of, for example, tetramethoxysilane over molten sodium. Based on our systematic investigations we identified reaction conditions to produce the methoxysilanes MenSi(OMe)4-n in excellent (n=0:100%) to acceptable yields (n=1:51%; n=2:27%); the yield of HSi(OMe)3 is about 85%. Thus, the methoxysilanes formed might possibly open the door for future routes to silicon-based products. Amorphous silicon is easily synthesized from tetrahalosilanes SiX4 (X=Cl, F) and molten sodium in different solvents. Reactivity studies prove the resulting materials as versatile tools for the formation of technical important silanes, such as the silicon chloro-, alkoxy-, and methylalkoxy-substituted derivatives (see figure; bl=black, br=brown).

METHOD OF MAKING A TRIHALOSILANE

-

Page/Page column 24, (2012/06/30)

A method of making a trihalosilane comprising contacting an organotrihalosilane according to the formula RS1X3 (I), wherein R is C1-C10 hydrocarbyl and each X independently is halo, with hydrogen, wherein the mole ratio of the organotrihalosilane to hydrogen is from 0.009:1 to 1:2300, in the presence of a catalyst comprising a metal selected from (i) Re, (ii) a mixture comprising Re and at least one element selected from Pd, Ru, Mn, Cu, and Rh, (iii) a mixture comprising Ir and at least one element selected from Pd and Rh, (iv) Mn, (v) a mixture comprising Mn and Rh, (vi) Ag, (vii) Mg, and (viii) Rh at from 300 to 800 °C to form a trihalosilane.

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