46020-63-7

Usage

Uses

Used in Organic Chemistry:
2,4-Difluoro-benzenesulfonic acid is used as a reagent for various chemical reactions, such as esterification, alkylation, and Friedel-Crafts reactions, for the introduction of the sulfonic acid functional group into organic molecules.
Used in Pharmaceutical Synthesis:
DFBSA is used as a reagent in the development of pharmaceuticals and fine chemicals, where its high reactivity and versatility make it a valuable tool for chemists and researchers.

Upstream product

• 372-18-9 1,3-Difluorobenzene 
• 1413781-20-0 N-(2,4-difluorobenzenesulfonyloxy)anthracene-1,9-dicarboximide 

Downstream Products

• 119197-12-5 C₉H₁₂F₂O₃SSi 
• 13918-92-8 2,4-difluorobenzene-1-sulfonyl chloride 

Relevant academic research and scientific papers

1-Acetylferroceneoxime-based photoacid generators: Application towards sol-gel transformation and development of photoresponsive polymer for controlled wettability and patterned surfaces

A newsworthy class of carboxylate and sulfonate esters of 1-acetylferroceneoxime has been demonstrated as non-ionic photoacid generators (PAGs). PAGs based on 1-acetylferroceneoxime were synthesized in good yields by simple treatment of 1-acetylferroceneoxime with various carboxylic and sulfonyl chlorides. Newly developed PAGs of 1-acetylferroceneoxime showed good absorbance >350 nm. On irradiation using UV light (≥365 nm), carboxylates and sulfonates of 1-acetyl ferroceneoxime in aqueous acetonitrile solvent underwent efficient homolytic cleavage of N-O bond, resulting in the generation of carboxylic and sulphonic acids, respectively, with high chemical and good quantum yields. Further, we demonstrated the application of our newly developed 1-acetylferroceneoxime-based PAGs for gelation of biopolymer alginate on UV irradiation. More interestingly, we synthesized a ferroceneoxime bound photoresponsive polymer, 1-acetylferroceneoxime-polycaprolactone (AFO-PCL), and demonstrated its controlled surface wettability and generation of patterned surfaces.

Synthesis, photophysical and photochemical properties of photoacid generators based on N-hydroxyanthracene-1,9-dicarboxyimide and their application toward modification of silicon surfaces

We have introduced a series of nonionic photoacid generators (PAGs) for carboxylic and sulfonic acids based on N-hydroxyanthracene-1,9-dicarboxyimide (HADI). The newly synthesized PAGs exhibited positive solvachromatic emission (λmax(hexane) 461 nm, λmax(ethanol) 505 nm) as a function of solvent polarity. Irradiation of PAGs in acetonitrile (ACN) using UV light above 410 nm resulted in the cleavage of weak Na-O bonds, leading to the generation of carboxylic and sulfonic acids in good quantum and chemical yields. Mechanism for the homolytic Na-O bond cleavage for acid generation was supported by time-dependent density functional theory (TD-DFT) calculations. More importantly, using the PAG monomer N-(p-vinylbenzenesulfonyloxy)anthracene- 1,9-dicarboxyimide (VBSADI), we have synthesized N-(p-vinylbenzenesulfonyloxy) anthracene-1,9-dicarboxyimidea-methyl methacrylate (VBSADI-MMA) and N-(p-vinylbenzenesulfonyloxy)anthracene-1,9-dicarboxyimidea-ethyl acrylate (VBSADI-EA) copolymer through atom transfer radical polymerization (ATRP). Finally, we have also developed photoresponsive organosilicon surfaces using the aforementioned polymers.

PEGYLATION PROCESS

The present invention relates to the attachment of a polyethylene glycol (PEG) moiety to a target substrate. Processes for such attachment will be hereinafter referred to as "PEGylation" of the substrate. In particular, the present invention relates to a process for direct covalent PEGylation of a substrate, comprising the reaction of a halogenated PEG with the substrate wherein the halogen of the halogenated PEG acts as a leaving group in the PEGylation reaction.

Trimethylsilylesters of Fluorobenzenesulfonic acids

Fluorobenzenesulfonic acids were prepared by electrophilic sulfonation of fluorobenzenes 1.The acids are obtained as hydrates and converted to their trimethylsilyl esters 2 for characterization.