46020-63-7

Basic information

• Product Name: 2,4-Difluoro-benzenesulfonic acid
• Synonyms: 2,4-Difluoro-benzenesulfonic acid;AMBERMOLTECH MPE-1180
• CAS NO: 46020-63-7
• Molecular Formula: C₆H₄F₂O₃S
• Molecular Weight: 194.1559664
• Mol File: 46020-63-7.mol
• Article Data: 4

Chemical Properties

• Appearance: /
• Density: 1.609
• PKA: -1.14±0.50(Predicted)
• CAS DataBase Reference: 2,4-Difluoro-benzenesulfonic acid(CAS DataBase Reference)
• NIST Chemistry Reference: 2,4-Difluoro-benzenesulfonic acid(46020-63-7)
• EPA Substance Registry System: 2,4-Difluoro-benzenesulfonic acid(46020-63-7)

Safety Data

• Hazardous Substances Data: 46020-63-7(Hazardous Substances Data)

Usage

General Description

2,4-Difluoro-benzenesulfonic acid, also known as DFBSA, is a synthetic chemical compound that is commonly used as a reagent in organic chemistry and pharmaceutical synthesis. It is a strong acid with the molecular formula C6H4F2O3S and a molar mass of 198.15 g/mol. DFBSA is a white crystalline solid that is soluble in water and polar organic solvents. It is used in various chemical reactions, such as esterification, alkylation, and Friedel-Crafts reactions, to introduce the sulfonic acid functional group into organic molecules. 2,4-Difluoro-benzenesulfonic acid is known for its high reactivity and versatility in organic synthesis, making it a valuable tool for chemists and researchers in the development of pharmaceuticals and fine chemicals.

Upstream product

• 372-18-9 1,3-Difluorobenzene 
• 1413781-20-0 N-(2,4-difluorobenzenesulfonyloxy)anthracene-1,9-dicarboximide 

Downstream Products

• 13918-92-8 2,4-difluorobenzene-1-sulfonyl chloride 
• 119197-12-5 C₉H₁₂F₂O₃SSi 

Relevant articles and documents

1-Acetylferroceneoxime-based photoacid generators: Application towards sol-gel transformation and development of photoresponsive polymer for controlled wettability and patterned surfaces

A newsworthy class of carboxylate and sulfonate esters of 1-acetylferroceneoxime has been demonstrated as non-ionic photoacid generators (PAGs). PAGs based on 1-acetylferroceneoxime were synthesized in good yields by simple treatment of 1-acetylferroceneoxime with various carboxylic and sulfonyl chlorides. Newly developed PAGs of 1-acetylferroceneoxime showed good absorbance >350 nm. On irradiation using UV light (≥365 nm), carboxylates and sulfonates of 1-acetyl ferroceneoxime in aqueous acetonitrile solvent underwent efficient homolytic cleavage of N-O bond, resulting in the generation of carboxylic and sulphonic acids, respectively, with high chemical and good quantum yields. Further, we demonstrated the application of our newly developed 1-acetylferroceneoxime-based PAGs for gelation of biopolymer alginate on UV irradiation. More interestingly, we synthesized a ferroceneoxime bound photoresponsive polymer, 1-acetylferroceneoxime-polycaprolactone (AFO-PCL), and demonstrated its controlled surface wettability and generation of patterned surfaces.

PEGYLATION PROCESS

The present invention relates to the attachment of a polyethylene glycol (PEG) moiety to a target substrate. Processes for such attachment will be hereinafter referred to as "PEGylation" of the substrate. In particular, the present invention relates to a process for direct covalent PEGylation of a substrate, comprising the reaction of a halogenated PEG with the substrate wherein the halogen of the halogenated PEG acts as a leaving group in the PEGylation reaction.