Cas 535952-25-1,tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone

535952-25-1

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Basic information

Product Name: tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone
Synonyms: tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone
CAS NO:535952-25-1
Molecular Formula:
Molecular Weight: 642.467
EINECS: N/A
Product Categories: N/A

Chemical Properties

Melting Point: N/A
Boiling Point: N/A
Flash Point: N/A
Appearance: N/A
Density: N/A
Refractive Index: N/A
Storage Temp.: N/A
Solubility: N/A
CAS DataBase Reference: tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone(CAS DataBase Reference)
NIST Chemistry Reference: tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone(535952-25-1)
EPA Substance Registry System: tetrahydro-2,5-bis(3-trifluoromethylphenylsulfonyloxy)cyclobuta[1,2-c:3,4-c']dipyrrole-1,3,4,6(2H,5H)-tetrone(535952-25-1)

Safety Data

Hazard Codes: N/A
Statements: N/A
Safety Statements: N/A
WGK Germany:
RTECS:
HazardClass: N/A
PackingGroup: N/A
Hazardous Substances Data: 535952-25-1(Hazardous Substances Data)

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Check Digit Verification of cas no

The CAS Registry Mumber 535952-25-1 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 5,3,5,9,5 and 2 respectively; the second part has 2 digits, 2 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 535952-25:
(8*5)+(7*3)+(6*5)+(5*9)+(4*5)+(3*2)+(2*2)+(1*5)=171
171 % 10 = 1
So 535952-25-1 is a valid CAS Registry Number.

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535952-25-1Relevant academic research and scientific papers

BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION

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Page 37, (2008/06/13)

The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an

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