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541-02-6

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541-02-6 Usage

Chemical Properties

liquid

Uses

Different sources of media describe the Uses of 541-02-6 differently. You can refer to the following data:
1. A cyclic volatile methylsiloxane (cVMS) used in cosmetic and personal care products. Used in dermal exposure and inhalation toxicity study.
2. Intermediate in the manufacture of high mol wt siloxane polymers. Carrier ingredient in personal care products; dry cleaning solvent.
3. cyclopentasiloxane is incorporated into a formulation for its emollient and solvent activity.
4. Octamethylcyclotetrasiloxane and decamethylcyclopentasiloxane are major industrial products, which are either marketed as such or used for the production of polydimethylsiloxanes.

General Description

D5 Cyclomethicone is a cyclic siloxane, that has a silicon-oxygen bond in a cyclic arrangement and methyl groups attached with the silicon atom. It is used in the production of some silicon-based polymers that are widely used in various personal care products.Pharmaceutical secondary standards for application in quality control, provide pharma laboratories and manufacturers with a convenient and cost-effective alternative to the preparation of in-house working standards.

Flammability and Explosibility

Nonflammable

Check Digit Verification of cas no

The CAS Registry Mumber 541-02-6 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 5,4 and 1 respectively; the second part has 2 digits, 0 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 541-02:
(5*5)+(4*4)+(3*1)+(2*0)+(1*2)=46
46 % 10 = 6
So 541-02-6 is a valid CAS Registry Number.
InChI:InChI=1/C10H30O5Si5/c1-16(2)11-17(3,4)13-19(7,8)15-20(9,10)14-18(5,6)12-16/h1-10H3

541-02-6 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (42412)  Decamethylcyclopentasiloxane, 97%   

  • 541-02-6

  • 50g

  • 184.0CNY

  • Detail
  • Alfa Aesar

  • (42412)  Decamethylcyclopentasiloxane, 97%   

  • 541-02-6

  • 250g

  • 570.0CNY

  • Detail
  • Alfa Aesar

  • (42412)  Decamethylcyclopentasiloxane, 97%   

  • 541-02-6

  • 1kg

  • 1823.0CNY

  • Detail
  • Sigma-Aldrich

  • (PHR1566)  D5 Cyclomethicone  pharmaceutical secondary standard; traceable to USP

  • 541-02-6

  • PHR1566-500MG

  • 791.15CNY

  • Detail
  • Sigma-Aldrich

  • (43217)  Decamethylcyclopentasiloxane  analytical standard

  • 541-02-6

  • 43217-250MG

  • 615.42CNY

  • Detail
  • USP

  • (1154809)  Cyclomethicone 5  United States Pharmacopeia (USP) Reference Standard

  • 541-02-6

  • 1154809-200MG

  • 4,326.66CNY

  • Detail
  • Aldrich

  • (444278)  Decamethylcyclopentasiloxane  97%

  • 541-02-6

  • 444278-50ML

  • 296.01CNY

  • Detail
  • Aldrich

  • (444278)  Decamethylcyclopentasiloxane  97%

  • 541-02-6

  • 444278-250ML

  • 913.77CNY

  • Detail

541-02-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name Decamethylcyclopentasiloxane

1.2 Other means of identification

Product number -
Other names DecaMethylcyclopentasiloxane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Adhesives and sealant chemicals,Anti-adhesive agents,CBI,Finishing agents,Intermediates,Solvents (which become part of product formulation or mixture)
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:541-02-6 SDS

541-02-6Synthetic route

2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane
433725-45-2

2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

C

tetravinyltetramethylcyclotetrasiloxane

tetravinyltetramethylcyclotetrasiloxane

D

copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

copoly(dimethylsiloxane/divinylsiloxane), prepared by anionic polymerization of 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane; monomer(s): 2,2,4,4,6,6-hexamethyl-8,8-divinylcyclotetrasiloxane

Conditions
ConditionsYield
With P4-t-Bu at 80℃; for 0.333333h; Further byproducts given;A n/a
B n/a
C n/a
D 80%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
at 0℃; Mechanism; other diorganyldichlorosilanes; reactions in the presence of hexamethyldisiloxane, trimethylchlorosilane, tetramethoxysilane, tetraethoxysilane;A 79%
B 48%
C 35%
D 12%
E 5%
dimethyl sulfoxide
67-68-5

dimethyl sulfoxide

A

chloro-methylsulfanyl-methane
2373-51-5

chloro-methylsulfanyl-methane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With dimethylsilicon dichloride at 0℃; Further byproducts given;A 79%
B 48%
C 35%
D 5%
phenyltrimethylsilyl ether
1529-17-5

phenyltrimethylsilyl ether

A

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

B

dimethyl-diphenoxy-silane
3440-02-6

dimethyl-diphenoxy-silane

C

C13H26O3Si3
18406-79-6

C13H26O3Si3

D

C11H20O2Si2

C11H20O2Si2

Conditions
ConditionsYield
With gallium(III) iodide at 175 - 180℃; for 3h; Yield given; Further byproducts given. Title compound not separated from byproducts;A n/a
B 79%
C n/a
D n/a
diiododimethylsilane
15576-81-5

diiododimethylsilane

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With 3,3-dimethyl-butan-2-one; zinc In dichloromethane for 0.166667h; Ambient temperature;A 60%
B 18%
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With pyridine; sodium hydrogencarbonate In ethyl acetate at 20℃; for 3h;A 60%
B 20%
C 15%
With water Autoclave;A 51.3%
B 29.2%
C 8%
With composite catalyst at 150℃; under 675.068 Torr; for 0.5h; Temperature; Pressure; Reagent/catalyst; Large scale;A n/a
B 43%
C n/a
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With dimethyl sulfoxide at 0℃; Further byproducts given;A 48%
B 35%
C 12%
D 5%
With tetrahydrofuran; lithium at 40 - 45℃; for 1h; Yield given. Further byproducts given. Yields of byproduct given;
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

E

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With H2O In water slow addn. of 4l (CH3)2SiCl2 to 12l H2O at 15-20°C withorous stirring; further products;; distn.;;A n/a
B 0.5%
C 42%
D 6.7%
E 1.6%
With hydrogenchloride In toluene at 20℃; for 4h; Product distribution; diff. concentration of aq. HCl; diff. reaction time; other difunctional organochlorosilanes;
With H2O In diethyl ether; water addn. of (CH3)2SiCl2 to ether-H2O; further products;; distn.;;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With water at 15 - 20℃; Autoclave;A 42%
B 6.7%
trimethyl phosphite
512-56-1

trimethyl phosphite

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

methylene chloride
74-87-3

methylene chloride

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

C

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

D

C7H21O6PSi3
1450711-54-2

C7H21O6PSi3

E

C9H27O7PSi4
1450711-55-3

C9H27O7PSi4

Conditions
ConditionsYield
at 20℃; for 10h; Inert atmosphere;A n/a
B 15%
C 10%
D 38%
E 33%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With iodine In dichloromethane for 0.333333h; Heating; Further byproducts given;A 14%
B 26%
C 21%
D 15%
diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With hydrogenchloride
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With water at 15 - 20℃;
With water Erhitzen der gebildeten nicht destillierbaren Produkte mit NaOH auf 230-240grad unter 1 mm;
Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With hydrogenchloride for 72h; Yield given. Yields of byproduct given. Title compound not separated from byproducts;
1,1,3,3,5,5,7,7,9,9-decamethylpentasiloxane-1,9-diol
7445-36-5

1,1,3,3,5,5,7,7,9,9-decamethylpentasiloxane-1,9-diol

A

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

B

permethyldecasiloxane-1,19-diol

permethyldecasiloxane-1,19-diol

Conditions
ConditionsYield
With trifluorormethanesulfonic acid In 1,4-dioxane at 35℃; Product distribution; Kinetics; var. of reagent, solvent;
chloro(2-chloroethoxy)dimethylsilane
62806-42-2

chloro(2-chloroethoxy)dimethylsilane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With potassium Sodium at 280 - 300℃; under 0.1 - 1 Torr; Yield given. Yields of byproduct given;
With potassium Sodium In gaseous matrix at 280 - 320℃; under 0.1 - 1 Torr; Product distribution;
2,2,4,4,6,6,8,8,10,10-Decamethyl-[1,3,5,7,9,2,4,6,8,10]pentoxapentasilecane; compound with trifluoro-methanesulfonic acid

2,2,4,4,6,6,8,8,10,10-Decamethyl-[1,3,5,7,9,2,4,6,8,10]pentoxapentasilecane; compound with trifluoro-methanesulfonic acid

4-Chloro-2-nitroaniline
89-63-4

4-Chloro-2-nitroaniline

A

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

B

4-Chloro-2-nitro-phenylamine; compound with trifluoro-methanesulfonic acid

4-Chloro-2-nitro-phenylamine; compound with trifluoro-methanesulfonic acid

Conditions
ConditionsYield
In benzene at 26.9℃; Equilibrium constant;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

tetradecamethylcycloheptasiloxane
107-50-6

tetradecamethylcycloheptasiloxane

B

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With hydrogenchloride In toluene at 20℃; for 4h; Yield given. Further byproducts given. Yields of byproduct given;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

Tetradecamethylcycloheptasilan
13452-94-3

Tetradecamethylcycloheptasilan

E

decamethylcyclopentasilane
13452-92-1

decamethylcyclopentasilane

F

dodecamethylcyclohexasilane
4098-30-0

dodecamethylcyclohexasilane

Conditions
ConditionsYield
With tetrahydrofuran; lithium at 40 - 45℃; Product distribution; Mechanism; various temperature, various reactant ratios;
3,3,6,6,9,9,12,12-Octamethyl-1,2,4,5,7,8,10,11-octaoxa-3,6,9,12-tetrasila-cyclododecane

3,3,6,6,9,9,12,12-Octamethyl-1,2,4,5,7,8,10,11-octaoxa-3,6,9,12-tetrasila-cyclododecane

A

Hexamethylcyclotrisiloxane
541-05-9

Hexamethylcyclotrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
at 50℃; Product distribution;
trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
at 190℃; for 10h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

C

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With aluminium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts;A 0.12 g
B n/a
C n/a
D n/a
1,3,5,7,9-pentachloro-1,3,5,7,9-pentamethylcyclopentasiloxane
18139-89-4

1,3,5,7,9-pentachloro-1,3,5,7,9-pentamethylcyclopentasiloxane

methyllithium
917-54-4

methyllithium

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

C

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
In diethyl ether at 0℃; Product distribution; other organometallic reagent and reaction conditions;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

1,1,3,3-tetramethyl-1,3-dichlorodisiloxane
2401-73-2

1,1,3,3-tetramethyl-1,3-dichlorodisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

D

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Conditions
ConditionsYield
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 65℃; for 2h; Yield given; Yields of byproduct given. Title compound not separated from byproducts;
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

Conditions
ConditionsYield
With sodium nitrate; 1,1,1,3,3,3-hexamethyl-disilazane at 20℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

1,5-dichlorohexamethyltrisiloxane
3582-71-6

1,5-dichlorohexamethyltrisiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

1,7-dichlorooctamethyltetrasiloxane
2474-02-4

1,7-dichlorooctamethyltetrasiloxane

B

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

1,9-dichlorodecamethylpentasiloxane
14741-59-4

1,9-dichlorodecamethylpentasiloxane

C

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With sodium nitrate at 0℃; for 2h; Yield given; Further byproducts given. Yields of byproduct given. Title compound not separated from byproducts;
Li[Al(perfluoro-tertbutoxide)4]

Li[Al(perfluoro-tertbutoxide)4]

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

Li(dimethylsiloxane)5[Al(OC(CF3)3)4]
896439-19-3

Li(dimethylsiloxane)5[Al(OC(CF3)3)4]

Conditions
ConditionsYield
In dichloromethane in Schlenk flask; mixed soln. concd. to saturation by stirring overnightat room temp.; stand for 1 d at -20°C; solvent removed under vac.; washed 3 times with n-hexane; elem. anal.;90%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

diisobutylaluminium hydride
1191-15-7

diisobutylaluminium hydride

(H(CH3)2Si(OAl(CH2CH(CH3)2)2)2Si(CH3)2)2O
254763-51-4

(H(CH3)2Si(OAl(CH2CH(CH3)2)2)2Si(CH3)2)2O

Conditions
ConditionsYield
In n-heptane stirring (3 d); evapn.; elem. anal.;84%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

dimethylaluminum hydride
865-37-2

dimethylaluminum hydride

(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2
254763-44-5

(CH3)2Si((OAl(CH3)2)2Si(CH3)2H)2

Conditions
ConditionsYield
In hexane stirring (4 d); evapn. (vac.); elem. anal.;68%
tetrahydrofuran
109-99-9

tetrahydrofuran

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

di(tert-butyl)aluminium hydride
70776-29-3

di(tert-butyl)aluminium hydride

HSi(CH3)2(OAl(C(CH3)3)2)2(Si(CH3)2O)2Al(C4H8O)(C(CH3)3)2
254763-53-6

HSi(CH3)2(OAl(C(CH3)3)2)2(Si(CH3)2O)2Al(C4H8O)(C(CH3)3)2

Conditions
ConditionsYield
In hexane stirring (3 d); filtering, recrystn. (hexane, -23°C); elem. anal.;66%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
19095-23-9

1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane

Conditions
ConditionsYield
With potassium hydroxide In water; toluene at 50℃; for 2h;61%
1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane
18001-60-0

1,1,3,3-tetraethoxy-1,3-dimethyldisiloxane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

1,3,3,5-tetramethyl-1,1,5,5-tetraethoxytrisiloxane

1,3,3,5-tetramethyl-1,1,5,5-tetraethoxytrisiloxane

Conditions
ConditionsYield
With cesium hydroxide at 100 - 130℃;58%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

A

iododimethylsilane
2441-21-6

iododimethylsilane

B

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With iodineA n/a
B 50%
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane
19095-23-9

1,1,3,3,5,5,7,7,9,9,11,11,13,13-tetradecamethylheptasiloxane

Conditions
ConditionsYield
With water; sulfur dioxide In hexane Ambient temperature;45%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

di(tert-butyl)aluminium hydride
70776-29-3

di(tert-butyl)aluminium hydride

(H(CH3)2Si(OAl(C(CH3)3)2)2Si(CH3)2)2O
254763-49-0

(H(CH3)2Si(OAl(C(CH3)3)2)2Si(CH3)2)2O

Conditions
ConditionsYield
In hexane stirring (4 d); filtering, evapn. (vac.), recrystn. (pentane, -78°C);;44%
silver hexafluoroantimonate

silver hexafluoroantimonate

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

A

Ag(1+)*[((CH3)2SiO)6]=[((CH3)2SiO)6Ag](1+)

Ag(1+)*[((CH3)2SiO)6]=[((CH3)2SiO)6Ag](1+)

B

[((CH3)2SiO)7Ag](1+)*SbF6(1-)=[((CH3)2SiO)7Ag][SbF6]
945917-62-4

[((CH3)2SiO)7Ag](1+)*SbF6(1-)=[((CH3)2SiO)7Ag][SbF6]

Conditions
ConditionsYield
In sulfur dioxide Ag. compd treated with ligand (3.6:2.58 molar ratio), cooled to 77 K, SO2 added, warmed to room temp., pptd.; filtered off, MAS, NMR;A n/a
B 23%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

cyclomaltooctaose
17465-86-0

cyclomaltooctaose

C10H30O5Si5*4C48H80O40

C10H30O5Si5*4C48H80O40

Conditions
ConditionsYield
In water at 20℃; Sonication;11%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

2,7-dimethyl-2,3:7,8-diepoxy-5-silaspiro<4.4>nonane
63683-92-1

2,7-dimethyl-2,3:7,8-diepoxy-5-silaspiro<4.4>nonane

2,2,4,4,8,8,10,10,12,12-decamethyl-2,4,6,8,10,12-hexasila-1,3,5,7,9,11,13-heptaoxaspiro<5.7>tridecane
17995-45-8

2,2,4,4,8,8,10,10,12,12-decamethyl-2,4,6,8,10,12-hexasila-1,3,5,7,9,11,13-heptaoxaspiro<5.7>tridecane

Conditions
ConditionsYield
at 520℃; under 0.0001 Torr; for 3.25h;9%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

A

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

B

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With dodecylbenzene-sulphonic acid; acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity;A 1.08%
B 2.05%
With toluene-4-sulfonic acid at 120℃; for 4 - 24h; Product distribution / selectivity;A 0.56%
B 0.59%
With molecular sieve; dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.014 - 24h; Product distribution / selectivity;A 0%
B 0%
With molecular sieve at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity;A 0.67%
B 0.92%
With acetic acid at 120℃; for 4 - 24h; Product distribution / selectivity;A 0.1%
B 0.48%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With toluene-4-sulfonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity;0.68%
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity;0.74%
With dodecylbenzene-sulphonic acid at 20 - 120℃; for 0.017 - 24h; Product distribution / selectivity;0.7%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

Conditions
ConditionsYield
With hydrogenchloride at 120℃; for 4 - 24h; Product distribution / selectivity;0.1%
decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

dimethyldifluorosilane
353-66-2

dimethyldifluorosilane

Conditions
ConditionsYield
With hydrogen fluoride; copper(II) sulfate
dimethylmonochlorosilane
1066-35-9

dimethylmonochlorosilane

decamethylcyclopentasiloxane
541-02-6

decamethylcyclopentasiloxane

1-chloro-1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane
132118-77-5

1-chloro-1,1,3,3,5,5,7,7,9,9,11,11-dodecamethylhexasiloxane

Conditions
ConditionsYield
With water; pyrographite for 5h; Ambient temperature; Yield given;

541-02-6Relevant articles and documents

Tris(pentafluorophenyl)borane-Catalyzed Reactions of Siloxanes: A Combined Experimental and Computational Study

Mathew, Jomon,Eguchi, Katsuya,Nakajima, Yumiko,Sato, Kazuhiko,Shimada, Shigeru,Choe, Yoong-Kee

, p. 4922 - 4927 (2017)

The reaction of 1,1,3,3-tetramethyldisiloxane with 1-octene as a model reaction of silicone curing catalyzed by B(C6F5)3 resulted in the redistribution of the disiloxane into dimethylsilane and cyclic oligosiloxanes, and the subsequent hydrosilylation reaction of dimethylsilane afforded dimethyldioctylsilane. To obtain insights into the reaction mechanism and possibility alter the reaction pathway to favor the hydrosilylation over the redistribution, mechanistic analysis of the reaction between a hydrosiloxane (1,1,3,3-tetramethyldisiloxane, silox-H) and a vinylsiloxane (1,1,3,3-tetramethyl-1,3-divinyldisiloxane, silox-vin) in the presence of B(C6F5)3 was performed through density functional theory calculations. The results of the calculations indicate that the activation of a Si–H bond in silox-H by B(C6F5)3 initiates the reaction to form the B(C6F5)3–silox-H complex with a Lewis acidic silicon atom and a hydridic hydrogen atom. The B(C6F5)3–silox-H complex can undergo two different reaction pathways, that is, trisiloxane formation and the hydrosilylation of silox-vin by silox-H. The trisiloxane formation involves trisilyloxonium ions as intermediates and can lead to either the homotrisiloxane of silox-H or a mixed trisiloxane of silox-H and silox-vin. The energetics of the reaction pathways predict the preference of trisiloxane formation over hydrosilylation, and the fine tuning of the steric and electronic natures of the substrates could alter the thermodynamic and kinetic favorability.

Hydrogenolysis of Polysilanes Catalyzed by Low-Valent Nickel Complexes

Comas-Vives, Aleix,Eiler, Frederik,Grützmacher, Hansj?rg,Pribanic, Bruno,Trincado, Monica,Vogt, Matthias

supporting information, p. 15603 - 15609 (2020/04/29)

The dehydrogenation of organosilanes (RxSiH4?x) under the formation of Si?Si bonds is an intensively investigated process leading to oligo- or polysilanes. The reverse reaction is little studied. To date, the hydrogenolysis of Si?Si bonds requires very harsh conditions and is very unselective, leading to multiple side products. Herein, we describe a new catalytic hydrogenation of oligo- and polysilanes that is highly selective and proceeds under mild conditions. New low-valent nickel hydride complexes are used as catalysts and secondary silanes, RR′SiH2, are obtained as products in high purity.

METHOD FOR PRODUCING SILOXANE OLIGOMER

-

Paragraph 0034; 0045, (2017/07/23)

PROBLEM TO BE SOLVED: To provide a production method capable of simply producing a siloxane oligomer in a high yield when producing a siloxane oligomer by hydrolysis of a silicon halide compound and to provide a production method capable of selectively producing a linear or cyclic siloxane oligomer in particular. SOLUTION: The siloxane oligomer can be efficiently produced without performing any special agitation by providing two electrospray nozzles to oppose to each other in a medium liquid and in the medium liquid, electrostatically spraying in an electric field a first liquid sample containing a silicon halide compound from one nozzle and electrostatically spraying in an electric field a second liquid sample containing water from the other nozzle and allowing the liquid samples to collide and fuse with each other. SELECTED DRAWING: None COPYRIGHT: (C)2017,JPO&INPIT

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