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54513-94-9

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54513-94-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 54513-94-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,4,5,1 and 3 respectively; the second part has 2 digits, 9 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 54513-94:
(7*5)+(6*4)+(5*5)+(4*1)+(3*3)+(2*9)+(1*4)=119
119 % 10 = 9
So 54513-94-9 is a valid CAS Registry Number.

54513-94-9Downstream Products

54513-94-9Relevant academic research and scientific papers

Kinetic Study of the Phthalimide N-Oxyl Radical in Acetic Acid. Hydrogen Abstraction from Substituted Toluenes, Benzaldehydes, and Benzyl Alcohols

Koshino, Nobuyoshi,Saha, Basudeb,Espenson, James H.

, p. 9364 - 9370 (2007/10/03)

The phthalimide N-oxyl (PINO) radical was generated by the oxidation of N-hydroxyphthalimide (NHPI) with Pb(OAc)4 in acetic acid. The molar absorptivity of PINO. is 1.36 × 103 L mol -1 cm-1 at λmax 382 nm. The PINO radical decomposes slowly with a second-order rate constant of 0.6 ± 0.1 L mol-1 s-1 at 25°C. The reactions of PINO . with substituted toluenes, benzaldehydes, and benzyl alcohols were investigated under an argon atmosphere. The second-order rate constants were correlated by means of a Hammett analysis. The reactions with toluenes and benzyl alcohols have better correlations with σ+ (ρ = -1.3 and -0.41), and the reaction with benzaldehydes correlates better with σ (ρ = -0.91). The kinetic isotope effect was also studied and significantly large values of kH/kD were obtained: 25.0 (p-xylene), 27. 1 (toluene), 27.5 (benzaldehyde), and 16.9 (benzyl alcohol) at 25°C. From the Arrhenius plot for the reactions with p-xylene and p-xylene-d10, the difference of the activation energies, EaD - E aH, was 12.6 ± 0.8 kJ mol-1 and the ratio of preexponential factors, AH/AD, was 0.17 ± 0.05. These findings indicate that quantum mechanical tunneling plays an important role in these reactions.

Dissociation Rate Constants of Alkylbenzenes from Hot Molecules Formed by 158-nm (F2 Laser) Irradiation

Shimada, Tetsuya,Ojima, Yuichi,Nakashima, Nobuaki,Izawa, Yasukazu,Yamanaka, Chiyoe

, p. 6298 - 6302 (2007/10/02)

Toluene, p-xylene, deuterated p-xylene, and mesitylene under low-pressure conditions as well as p-xylene under high-pressure conditions were studied with a 158-nm laser.Rise curves of the photoproducts were observed by the method of nanosecond laser photolysis.The ground-state alkylbenzenes with an internal energy of 8 eV are formed by internal conversion following the laser excitation.The alkylbenzenes dissociate to the corresponding benzyl-type and phenyl-type radicals via the hot molecule state.The dissociaton rate constants were 9.3 (+/- 0.7) x 107 s-1, 1.5 (+/- 0.3) x 107 s-1, 4.6 (+/- 0.4) x 106 s-1, and 3.0 (+/- 0.9) x 106 s-1, respectively.Dissociation rate constants of the C-H bond in the methyl group of the alkylbenzenes were estimated from these results and compared with previous predictions.

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