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Trisilane, 1,1,1,3,3,3-hexamethyl-2-phenyl-2-[(trimethylsilyl)ethynyl]-, is a complex organosilicon compound characterized by its unique molecular structure. It features a trisilane core, which consists of three silicon atoms bonded together, with each silicon atom connected to various substituents. The compound is further adorned with a phenyl group and an ethynyl group, which is itself attached to a trimethylsilyl moiety. This intricate arrangement of atoms and functional groups endows the compound with specific chemical properties and potential applications in the fields of materials science and organic synthesis. Its hexamethyl and trimethylsilyl groups contribute to its stability and reactivity, making it a subject of interest for researchers exploring the properties and reactions of organosilicon compounds.

63242-93-3

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63242-93-3 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 63242-93-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 6,3,2,4 and 2 respectively; the second part has 2 digits, 9 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 63242-93:
(7*6)+(6*3)+(5*2)+(4*4)+(3*2)+(2*9)+(1*3)=113
113 % 10 = 3
So 63242-93-3 is a valid CAS Registry Number.

63242-93-3Downstream Products

63242-93-3Relevant academic research and scientific papers

PHOTOLYSIS OF ORGANOPOLYSILANES. PHOTOCHEMICAL FORMATION AND REACTIONS OF 1-TRIMETHYLSILYL-1-PHENYL-1-SILACYCLOPROPENE DERIVATIVES

Ishikawa, Mitsuo,Nakagawa, Ken-Ichi,Kumada, Makoto

, p. 117 - 128 (2007/10/02)

The photolysis of tris(trimethylsilyl)phenylsilane (I) in the presence of 1-hexyne, 3,3-dimethyl-1-butyne, trimethylsilylacetylene, 3-hexyne, 1-trimethylsilylpropyne, 1,2-bis(trimethylsilyl)acetylene and 2,2,5,5-tetramethyl-3-hexyne afforded the respective silacyclopropenes.The silacyclopropenes produced from monosubstituted acetylenes underwent photochemical isomerization to give disilanylacetylene derivatives, via a 1,2-hydrogen shift in the silacyclopropene ring.Irradiation of I in the presence of 3-hexyne, 1-trimethylsilylpropyne or 2,2,5,5-tetramethyl-3-hexyne gave the corresponding silacyclopropenes which could be isolated by preparative GLC.The silacyclopropene from 1,2-bis(trimethylsilyl)acetylene, however, readily underwent thermal rearrangement to give trimethylsilylacetylene via a 1,2-trimethylsilyl shift.This type of rearrangement was also found in the photochemical process.

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