63669-79-4

Basic information

• Product Name: 1-Naphthalenesulfonic acid, 6-diazo-5,6-dihydro-5-oxo-, 4-benzoylphenyl ester
• CAS NO: 63669-79-4
• Molecular Formula: C23H14N2O5S
• Molecular Weight: 430.441
• Mol File: 63669-79-4.mol

Chemical Properties

• CAS DataBase Reference: 1-Naphthalenesulfonic acid, 6-diazo-5,6-dihydro-5-oxo-, 4-benzoylphenyl ester(CAS DataBase Reference)
• NIST Chemistry Reference: 1-Naphthalenesulfonic acid, 6-diazo-5,6-dihydro-5-oxo-, 4-benzoylphenyl ester(63669-79-4)
• EPA Substance Registry System: 1-Naphthalenesulfonic acid, 6-diazo-5,6-dihydro-5-oxo-, 4-benzoylphenyl ester(63669-79-4)

Safety Data

• Hazardous Substances Data: 63669-79-4(Hazardous Substances Data)

Upstream product

• 1001756-09-7 2-diazo-1-oxo-1,2-dihydronaphthalene-4-sulfonyl chloride 
• 1137-42-4 4-Hydroxybenzophenone 

Downstream Products

• 136849-96-2 4-(Inden-4-sulfonyl-oxy)-benzophenone 
• 136849-97-3 4-(Inden-7-sulfonyl-oxy)-benzophenone 
• 73013-92-0 1-Oxomethylene-1H-indene-4-sulfonic acid 4-benzoyl-phenyl ester 
• 136849-95-1 4-(3-Carboxy-indene-7-sulfonyl-oxy)-benzophenone 

Relevant articles and documents

Chromophore Specific Photoreactivity in 2,3,4-Tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone

Different electronic structures for the three 1,2-naphthoquinone-2-diazide (NQD) chromophores in 2,3,4-tri(1,2-naphthoquinone-2-diazide-5-sulfonyl-oxy)-benzophenone were detected using 1H NMR spectroscopy.The NQD substituent in the o-position of the benzophenone is influenced by intramolecular through space interactions with the benzophenone part of the molecule.The change in the electronic structure is the reason for the obtained different photoreactivity of the o-NQD chromophore compared with m-NQD and p-NQD.The relative quantum yields of photolysis are 0.3 (o-NQD) and 0.9/1.0 (m-NQD/p-NQD).

Reduction Processes in the Fast Atom Bombardment Mass Spectrometry of Sulfonyl Esters of Diazonaphthalenones

Orthoquinone diazides, which are widely used in microlithography, have attracted considerable attention, especially in terms of their application in the production of high-contrast resists.Previous electron impact mass spectrometric results have confirmed that the primary fragmentation process of these compounds is the elimination of N2 to form an indenoketene ion.This is analogous to the photodecomposition pathway which makes them effective in the lithographic process.Those results also revealed the occurrence of an alternative process, which involves a two-hydrogen reduction of the intermediate species formed prior to conversion to the ketene.The present study investigates the behaviour of the orthoquinone diazides when there is an abundance of protons available to form the reduction product.Several different types of diazonaphthalenone sulfonyl esters, ranging in complexity from the monosubstituted phenol esters to disubstituted dihydroxybenzophenones, were examined using fast atom bombardment mass spectrometry.Although reduction was the primary process in the hydrogen-rich matrices, the extent of reduction was characteristic of the particular isomer as well as the matrix used.