Cas 645402-18-2,2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole

645402-18-2

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Basic information

Product Name: 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole
Synonyms: 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole
CAS NO:645402-18-2
Molecular Formula:
Molecular Weight: 715.725
EINECS: N/A
Product Categories: N/A

Chemical Properties

Melting Point: N/A
Boiling Point: N/A
Flash Point: N/A
Appearance: N/A
Density: N/A
Refractive Index: N/A
Storage Temp.: N/A
Solubility: N/A
CAS DataBase Reference: 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole(CAS DataBase Reference)
NIST Chemistry Reference: 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole(645402-18-2)
EPA Substance Registry System: 2,2'-bis(2-chlorophenyl)-4,4'-5,5'-tetrakis(4-methylphenyl)-1,2'-biimidazole(645402-18-2)

Safety Data

Hazard Codes: N/A
Statements: N/A
Safety Statements: N/A
WGK Germany:
RTECS:
HazardClass: N/A
PackingGroup: N/A
Hazardous Substances Data: 645402-18-2(Hazardous Substances Data)

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Check Digit Verification of cas no

The CAS Registry Mumber 645402-18-2 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 6,4,5,4,0 and 2 respectively; the second part has 2 digits, 1 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 645402-18:
(8*6)+(7*4)+(6*5)+(5*4)+(4*0)+(3*2)+(2*1)+(1*8)=142
142 % 10 = 2
So 645402-18-2 is a valid CAS Registry Number.

645402-18-2Upstream product

645402-19-3 2-(2-chloro-phenyl)-4,5-di-p-tolyl-1H-imidazole

645402-18-2Downstream Products

645402-18-2Relevant academic research and scientific papers

THIOL COMPOUND AND PHOTOSENSITIVE COMPOSITION USING THE SAME

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Page/Page column 54-55, (2008/06/13)

The present invention relates to a thiol compound represented by formula (1) : wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

THIOL COMPOUND, AND PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX RESIST COMPOSITION USING THE COMPOUND

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Page/Page column 52-53, (2010/11/08)

The invention is related to a thiol compound represented by formula (1), production method thereof, and a photosensitive composition and a resist composition for black matrix for color filters which use the thiol compound and are excellent in sensitivity and can keep the line width in patterns unchanged, i. e. attain an excellent developing latitude. (All the symbols have the same meanings as defined in the Description.)

HEXAARYLBIIMIDAZOLE COMPOUNDS AND PHOTOPOLYMERIZATION INITIATOR COMPOSITIONS CONTAINING THE SAME

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Page 32, (2010/02/06)

The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R1 represents a halogen, and each R2 represents an optionally substituted C1-4 alkyl group. The hexaarylbiimida

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