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Anthracene, 9-(4-ethenylphenyl)-10-phenyl-, is a complex organic compound with the chemical formula C24H18. It is a derivative of anthracene, a tricyclic aromatic hydrocarbon consisting of three fused benzene rings. The compound features a 4-ethenylphenyl group attached to the 9th carbon atom and a phenyl group attached to the 10th carbon atom of the anthracene core. This specific arrangement of substituents gives the molecule unique chemical and physical properties, making it a potential candidate for various applications in the fields of materials science, pharmaceuticals, and organic chemistry. Due to its complex structure, the compound may exhibit different reactivity and stability compared to other anthracene derivatives, and further research is needed to explore its potential applications and properties.

6671-65-4

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6671-65-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 6671-65-4 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 6,6,7 and 1 respectively; the second part has 2 digits, 6 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 6671-65:
(6*6)+(5*6)+(4*7)+(3*1)+(2*6)+(1*5)=114
114 % 10 = 4
So 6671-65-4 is a valid CAS Registry Number.

6671-65-4Downstream Products

6671-65-4Relevant academic research and scientific papers

Imaging by sensitized oxygenations of photochromic anthracene films: Examination of effects that improve performance and reversibility

Fudickar, Werner,Linker, Torsten

, p. 9276 - 9283 (2006)

The aliphatic anthracene compound 1 and the oligomeric anthracene 2 were synthesized. Thin films of 1 and 2 mixed with the sensitizers tetraphenylporphyrin (TPP) and methylene blue (MB) were irradiated with visible light in air. Upon formation of singlet oxygen, the anthracene units were converted quantitatively to the corresponding endoperoxides. Heating of the irradiated samples afforded the parent anthracenes with high yields. Here, we demonstrate that the kinetics and reversibility of this reaction strongly depend on the microenvironment of the anthracene groups in the two compounds. The photooxidation of thin films of 1 is accompanied by interesting changes in the morphology of the film and allows the first application of 1 as a nondestructive negative-tone photoresist for lithography and as an oxidizing ink. The morphology of 2 remained unchanged after photooxidation as a result of the stabilizing oligomer back-bone. This stabilizing effect significantly improves the photochromic performance of 2. The reversibility of the photooxidation is very high (> 90%) for oligomeric films of 2 after several cycles of irradiation and heating. Decomposition of the anthracene and a loss of the activity of the sensitizer diminish slightly the performance of the monomeric species.

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