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(~2~H_3_)silyl is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

69103-84-0

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69103-84-0 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 69103-84-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 6,9,1,0 and 3 respectively; the second part has 2 digits, 8 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 69103-84:
(7*6)+(6*9)+(5*1)+(4*0)+(3*3)+(2*8)+(1*4)=130
130 % 10 = 0
So 69103-84-0 is a valid CAS Registry Number.

69103-84-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name trideuteriosilicon

1.2 Other means of identification

Product number -
Other names Silyl-d3 radical

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:69103-84-0 SDS

69103-84-0Downstream Products

69103-84-0Relevant academic research and scientific papers

Infrared spectra of group 14 hydrides in solid hydrogen: Experimental observation of Pbh4, Pb2H2, and Pb2H4

Wang, Xuefeng,Andrews, Lester

, p. 6581 - 6587 (2007/10/03)

Laser-ablated Si, Ge, Sn, and Pb atoms have been co-deposited with pure hydrogen at 3.5 K to form the group 14 hydrides. The initial SiH2 product reacts completely to SiH4, whereas substantial proportions of GeH2, SnH

Direct kinetic studies of SiH3 + SiH3, H, CCl4, SiD4, Si2H6, and C3H6 by tunable infrared diode laser spectroscopy

Loh, S. K.,Jasinski, J. M.

, p. 4914 - 4926 (2007/10/02)

Gas phase reactions of silyl radical, SiH3, are investigated at room temperature using tunable diode laser flash kinetic spectroscopy.Photolytic generation of silyl at 193 and 248 nm is demonstrated using several different precursor systems.The silyl recombination reaction, SiH3 + SiH3 -> Si2H6, is studied by quantitative measurement of SiH3 and attendant product densities.Analysis yields a refinement of the rate constant, krc = (7.9 +/- 2.9) * 10-11 cm3 molecule-1 s-1.By modeling silyl densities following photolysis of HCl in SiH4, bimolecular rate constants for H + SiH3 and H + SiH4 are determined to be (2 +/- 1) * 10-11 and (2.5 +/- 0.5) * 10-13 cm3 molecule-1 s-1, respectively.Reactions of SiH3 with SiD4, Si2H6, CCl4, and C3H6 (propylene) are studied under pseudo-first-order conditions.Derived upper limits to the rate constants show these reactions to be slow at room temperature.The data demonstrate the reactivity of silyl with open-shell (radical) species and the general inertness of silyl toward closed shell molecules.Under typical chemical vapor deposition conditions, SiH3 is, therefore, a kinetically long-lived species in the gas phase and consequently a potentially important film forming species under plasma and photochemical deposition conditions.

REACTIONS OF SILICON CLUSTERS WITH SiD4: FORMATION OF STRUCTURAL ISOMERS.

Reents Jr.,Mandich

, p. 2908 - 2912 (2007/10/02)

Bare and partially hydrogenated silicon clusters, Si//mD//n** plus , react with SiD//4 to produce structural isomers of Si//2D//2** plus , Si//3D//4** plus , and Si//4D//2** plus . These structural isomers are distinguished by their different reaction rat

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