69432-40-2

Basic information

• Product Name: 2-(4-METHOXY-1-NAPHTHYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE
• Synonyms: 2-(4-METHOXY-1-NAPHTHYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE;4,6-Bis-(trichloromethyl)-2-(4-methoxynaphthyl)-1,3,5-triazine;2-(4-Methoxynaphthalen-1-yl)-4,6-bis(trichloromethyl)-1,3,5-triazine;BU 1557;TAZ 106;Triazine B;1,3,5-Triazine,2-(4-methoxy-1-naphthalenyl)-4,6-bis(trichloromethyl)-;CAS:69432-40-2
• CAS NO: 69432-40-2
• Molecular Formula: C16H9Cl6N3O
• Molecular Weight: 471.98
• Mol File: 69432-40-2.mol
• Article Data: 1

Chemical Properties

• Appearance: /
• CAS DataBase Reference: 2-(4-METHOXY-1-NAPHTHYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE(CAS DataBase Reference)
• NIST Chemistry Reference: 2-(4-METHOXY-1-NAPHTHYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE(69432-40-2)
• EPA Substance Registry System: 2-(4-METHOXY-1-NAPHTHYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE(69432-40-2)

Safety Data

• Hazardous Substances Data: 69432-40-2(Hazardous Substances Data)

Usage

General Description

2-(4-Methoxy-1-naphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine is a synthetic chemical compound with the molecular formula C17H13Cl6N3O. It is a member of the triazine family of compounds and is used as a reactive intermediate in the production of various materials and products, including dyes, pigments, and pharmaceuticals. The compound is a white solid at room temperature and is soluble in organic solvents. Its trichloromethyl groups make it a highly reactive and potentially hazardous substance, and it should be handled with caution in a controlled laboratory environment. The compound’s specific properties and reactivity make it valuable in a wide range of industrial applications.

Relevant articles and documents

Compounds for use in a positive-working resist composition

Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo?3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.