71255-78-2 Usage
Uses
Used in Pharmaceutical Industry:
2-(3,4-METHYLENEDIOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE is used as a reactant for the synthesis of various pharmaceutical compounds, leveraging its unique structure to create new drugs with specific therapeutic properties.
Used in Agrochemical Industry:
In the agrochemical sector, 2-(3,4-METHYLENEDIOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE is utilized as a reactant in the production of agrochemicals, contributing to the development of pesticides and other agricultural chemicals that enhance crop protection and yield.
Used as a Building Block in Organic Synthesis:
2-(3,4-METHYLENEDIOXYPHENYL)-4,6-BIS(TRICHLOROMETHYL)-1,3,5-TRIAZINE is employed as a building block in the synthesis of a range of organic compounds, taking advantage of its reactive triazine core and functional groups to form diverse chemical entities for various applications.
Check Digit Verification of cas no
The CAS Registry Mumber 71255-78-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,1,2,5 and 5 respectively; the second part has 2 digits, 7 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 71255-78:
(7*7)+(6*1)+(5*2)+(4*5)+(3*5)+(2*7)+(1*8)=122
122 % 10 = 2
So 71255-78-2 is a valid CAS Registry Number.
InChI:InChI=1/C12H5Cl6N3O2/c13-11(14,15)9-19-8(20-10(21-9)12(16,17)18)5-1-2-6-7(3-5)23-4-22-6/h1-3H,4H2
71255-78-2Relevant academic research and scientific papers
Compounds for use in a positive-working resist composition
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, (2008/06/13)
Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo?3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.
