71449-78-0

Basic information

• Product Name: 4-Thiophenyl phenyl diphenyl sulfonium hexafluoroantimonate
• Synonyms: diphenyl[4-(phenylthio)phenyl]-sulfoniu(oc-6-11)-hexafluoroantimonate(1-);Sulfonium,diphenyl[4-(phenylthio)phenyl]-,hexafluoroantimonate;(THIOPHENOXYPHENYL)DIPHENYLSULFONIUM HEXAFLUOROANTIMONATE-BIS(DIPHENYLSULFONIUM(DIPHENYLTHIOETHER HEXAFLUOROANTIMONATE)) BLEND;4-Thiophenyl phenyl diphenyl sulfonium hexafluoroantimonate;P-THIOPHENYL PHENYL DIPHENYL SULFONIUM HEXAFLUOROANTIMONATE;P-THIOPHENYL PHENYL DIPHENYL;Diphenyl[4-(phenylthio)phenyl]sulfonium hexafluoroantimonate;S,S-Diphenyl-S-4-thiophenoxyphenylsulfonium hexafluoroantimonate
• CAS NO: 71449-78-0
• Molecular Formula: C₂₄H₁₉S₂*F₆Sb
• Molecular Weight: 607.29
• EINECS: 1308068-626-2
• Product Categories: Mixed triarylsulfonium hexafluoro antimonate salts
• Mol File: 71449-78-0.mol
• Article Data: 4

Chemical Properties

• Melting Point: 118-119 °C
• Flash Point: 145°C
• Appearance: /
• Density: 1,4 g/cm3
• Vapor Pressure: 0.002Pa at 25℃
• Storage Temp.: Hygroscopic, -20°C Freezer, Under inert atmosphere
• Solubility: Chloroform (Sparingly), DMSO (Sparingly)
• CAS DataBase Reference: 4-Thiophenyl phenyl diphenyl sulfonium hexafluoroantimonate(CAS DataBase Reference)
• NIST Chemistry Reference: 4-Thiophenyl phenyl diphenyl sulfonium hexafluoroantimonate(71449-78-0)
• EPA Substance Registry System: 4-Thiophenyl phenyl diphenyl sulfonium hexafluoroantimonate(71449-78-0)

Safety Data

• Statements: 20/22-51/53
• Safety Statements: 26-36/37/39
• RIDADR: 1549
• HazardClass: 8
• PackingGroup: III
• Hazardous Substances Data: 71449-78-0(Hazardous Substances Data)

Usage

Uses

4-Thiophenyl Phenyl Diphenyl Sulfonium Hexafluoroantimonate is used as a catalyst for photocuring of epoxy resins.

Flammability and Explosibility

Notclassified

Upstream product

• 139-66-2 diphenyl sulfide 
• 945-51-7 1,1'-sulfinylbisbenzene 
• 3459-94-7 1,4-bis(phenylthio)benzene 

Relevant articles and documents

SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION

An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R 1 is a group represented by formula (2); R 2 and R 3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X - represents a monovalent polyatomic anion; R 4 to R 6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by -S-, -O-, -SO-, -SO 2 -, or -CO - .

PROCESS FOR PRODUCING SULFONIUM SALT

It is an object of the invention to provide a method which makes it possible to manufacture the desired sulfonium salts directly without using a metathesis process and without using acids in large excess amounts. An aryl compound (A) in which a hydrogen atom is bonded to at least one of the carbon atoms of the aryl group, and a sulfoxide compound (B) which can be expressed by the formula: R1 SO R2 (where R1 and R2 indicate hydrocarbon groups or heterocyclic groups which may be substituted, and which may be the same or different) are reacted in the presence of a strong acid (C) which can be expressed by the formula:HMXmYn (where M indicates an element of group IIIa or group Va of the periodic table, X indicates a halogen atom, Y indicates a hydroxyl group, m and n are integers which are such that m + n="4 and" n = 0 to 3 in cases where M is an element of group IIIa, and m and n are integers which are such that m + n="6 and" n = 0 to 2 in cases where M is an element of group Va).