73852-17-2Relevant articles and documents
Preparation method of 2, 6-dichlorophenylboronic acid
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Paragraph 0035-0039, (2020/12/29)
The invention discloses a preparation method of 2, 6dichlorophenylboronic acid, which belongs to the technical field of fine processing, and mainly comprises the following steps: adding magnesium chips into 2bromo 1, 3dichlorobenzene used as a raw material to prepare a Grignard reagent, reacting with trialkyl borate, and carrying out acidic hydrolysis to obtain a 2, 6dichlorophenylboronic acid crude product; and finally, recrystallizing and purifying to obtain pure 2, 6-dichlorophenylboronic acid. The preparation method is simple, raw materials are easy to obtain, and the method is suitable for large-scale industrial production.
2,6-dichlorophenylboronic acid synthesis method
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Paragraph 0050-0055, (2019/01/14)
The invention discloses a 2,6-dichlorophenylboronic acid synthesis method, which comprises: (1) mixing bromobenzene and tetrahydrofuran under nitrogen protection, adding n-butyllithium in a dropwise maner, and carrying out a thernal insulation reaction af
Moisture-Tolerant Frustrated Lewis Pair Catalyst for Hydrogenation of Aldehydes and Ketones
Gy?m?re, ádám,Bakos, Mária,F?ldes, Tamás,Pápai, Imre,Domján, Attila,Soós, Tibor
, p. 5366 - 5372 (2015/09/15)
In this paper, we report on the development of a bench-stable borane for frustrated Lewis pair catalyzed reduction of aldehydes, ketones, and enones. The deliberate fine-tuning of structural and electronic parameters of Lewis acid component and the choice of Lewis base provided for the first time, a moisture-tolerant FLP catalyst. Related NMR and DFT studies underpinned the unique behavior of this FLP catalyst and gave insight into the catalytic activity of the resulting FLP catalyst.
Inhibitors of α4 mediated cell adhesion
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, (2008/06/13)
The present invention relates to a pharmaceutical composition comprising as an active ingredient a compound of formula (I), wherein Ring A is an aromatic or a heterocyclic ring; Q is a bond, carbonyl, lower alkylene, lower alkenylene, —O-(lower alkylene)-, etc.; n is 0, 1 or 2; Z is oxygen or sulfur, W is oxygen, sulfur, —CH═CH—, —NH— or —N═CH—; R1, R2and R3are the same or different and are hydrogen, halogen, hydroxyl, a substituted or unsubstituted lower alkyl group, a substituted or unsubstituted lower alkoxy group, a substituted or unsubstituted amino group, etc.; R4is tetrazolyl, carboxyl group, amide or ester; R5is hydrogen, nitro, amino, hydroxyl, lower alkanoyl, lower alkyl etc.; R6is selected from (a) a substituted or unsubstituted phenyl group, (b) a substituted or unsubstituted pyridyl group, (c) a substituted or unsubstituted thienyl group, (d) a substituted or unsubstituted benzofuranyl group, etc.; or a pharmaceutically acceptable salt thereof.