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4-[1-(4-Fluorophenyl)-1-(4-hydroxyphenyl)ethyl]phenol is a complex organic compound with the molecular formula C20H17FO2. It is characterized by a phenol group (C6H5OH) at one end, connected to an ethyl group (C2H5), which in turn is linked to two phenyl rings (C6H5). One of these phenyl rings is substituted with a fluorine atom (F), while the other is substituted with a hydroxyl group (OH). 4-[1-(4-FLUOROPHENYL)-1-(4-HYDROXYPHENYL)ETHYL]PHENOL is known for its potential applications in various fields, including pharmaceuticals and materials science, due to its unique structure and properties. It is important to note that the handling and use of this chemical should be done with caution, as it may have specific safety and environmental considerations.

741-35-5

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741-35-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 741-35-5 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 7,4 and 1 respectively; the second part has 2 digits, 3 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 741-35:
(5*7)+(4*4)+(3*1)+(2*3)+(1*5)=65
65 % 10 = 5
So 741-35-5 is a valid CAS Registry Number.

741-35-5Upstream product

741-35-5Downstream Products

741-35-5Relevant academic research and scientific papers

NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

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, (2010/04/25)

The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

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Page/Page column 14-15, (2008/12/04)

The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron.The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1- naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

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