754993-50-5Relevant academic research and scientific papers
Mononuclear precursor for MOCVD of HfO2 thin films
Baunemann, Arne,Thomas, Reji,Becker, Ralf,Winter, Manuela,Fischer, Roland A.,Ehrhart, Peter,Waser, Rainer,Devi, Anjana
, p. 1610 - 1611 (2004)
We report the precursor characteristics of a novel mononuclear mixed alkoxide compound [Hf(OiPr)2(tbaoac)2] and its application towards MOCVD of HfO2 thin films in a production tool CVD reactor.
