82639-01-8

Basic information

• Product Name: Trifluoro-acetic acid 1-(3-trifluoromethyl-phenyl)-ethyl ester
• CAS NO: 82639-01-8
• Molecular Weight: 286.174
• Mol File: 82639-01-8.mol

Chemical Properties

• CAS DataBase Reference: Trifluoro-acetic acid 1-(3-trifluoromethyl-phenyl)-ethyl ester(CAS DataBase Reference)
• NIST Chemistry Reference: Trifluoro-acetic acid 1-(3-trifluoromethyl-phenyl)-ethyl ester(82639-01-8)
• EPA Substance Registry System: Trifluoro-acetic acid 1-(3-trifluoromethyl-phenyl)-ethyl ester(82639-01-8)

Safety Data

• Hazardous Substances Data: 82639-01-8(Hazardous Substances Data)

Upstream product

• 402-24-4 3-(trifluoromethyl)styrene 
• 76-05-1 trifluoroacetic acid 

Relevant articles and documents

Solvolysis of 1-Arylethyl Tosylates. Kinetic and Stereochemical Tests for Solvent Participation

Solvolytic studies of the 1-arylethyl tosylates 8a (Ar=3-BrC6H4), 8b (Ar=3-CF3C6H4), and 8c (Ar=3,5-(CF3)2C6H3) show that in relatively nonnucleophilic solvents all three substrates have polarimetric rates markedly faster than rates of product formation.These products are largely racemic, but solvolysis of 8c in CF3CO2H gives 6percent net retention.In the more nucleophilic solvents the rates of product formation are close to the polarimetric rates and the products show extensive inversion of configuration.The results are interpreted in terms of an ion-pair mechanism in which nucleophilic solvent attack on the ion pair plays a major role.In the less nucleophilic solvents this attack is rate limiting, whereas attack of the more nucleophilic solvents is fast and initial ionization is rate limiting.Direct displacement by the solvent could contribute to the reactions in the more nucleophilic solvents but is not required by any of the results.The ion-pair mechanism provides a single consistent explanation for the results in all the solvents with all the substrates, and also readily accommodates a variety of other results in the literature, particularly the findings of oxygen and deuterium scrambling, and elimination during solvolysis.

Addition of Trifluoroacetic Acid to Substituted Styrenes

The rate of addition of CF3CO2H to a series of ring-substituted styrenes ArCH=CH2 with 100percent, 50percent, and 20percent solutions of the acid in CCl4 have been measured.The rate of addition of 100percent CF3CO2H to the isomeric 1-phenylpropenes and the rate of cis- to trans-stilbene isomerization by this acid are also reported.The rates are correlated with ?+ parameters of the substituents and with aqueous H2SO4-catalyzed hydrations of the same substrates.Deviations from the ?+ correlation occur with substituents capable of strong hydrogen bonding to the acidic solvents; these deviations are attributed to a decrease in substituent electron-donating ability caused by this interaction.All of the evidence supports a mechanism of rate-determining protonation on carbon (the AdE2 mechanism), with no detectable effects from ? complexation of the acids with the substrates.