82802-15-1Relevant academic research and scientific papers
POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION
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Page/Page column 82-83, (2010/05/13)
A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound h
Cobaloximes. Part 2. A Modified Schrauzer Synthesis for Base-sensitive Cobaloximes
Livermore, David G. H.,Widdowson, David A.
, p. 1019 - 1024 (2007/10/02)
The generation of a cobaloxime (I) anion in dimethyl sulphoxide provides a clean, non-aqueous reagent of low basicity particularly useful for the synthesis of base-sensitive cobaloximes.The method has been applied to the synthesis of esters of (2,2-dicarboxypropyl)cobaloximes and their monothio-analogues.
