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trans-Zn(hfac)2(aquo)(acetic acid) is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

844639-65-2

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844639-65-2 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 844639-65-2 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 8,4,4,6,3 and 9 respectively; the second part has 2 digits, 6 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 844639-65:
(8*8)+(7*4)+(6*4)+(5*6)+(4*3)+(3*9)+(2*6)+(1*5)=202
202 % 10 = 2
So 844639-65-2 is a valid CAS Registry Number.

844639-65-2Downstream Products

844639-65-2Relevant academic research and scientific papers

Oxidative dissolution of copper and zinc metal in carbon dioxide with tert-butyl peracetate and a β-diketone chelating agent

Visintin, Pamela M.,Bessel, Carol A.,White, Peter S.,Schauer, Cynthia K.,DeSimone, Joseph M.

, p. 316 - 324 (2005)

A series of β-diketone ligands, R1COCH2COR 2 [tmhdH (R1 = R2 = C(CH3) 3); tfacH (R1 = CF3; R2 = CH 3); hfacH (R1 = R2 = CF3)], in combination with tert-butyl peracetate (t-BuPA), have been investigated as etchant solutions for dissolution of copper metal into carbon dioxide solvent. Copper removal in CO2 increases in the order tfacH A study of the reactions of the hfacH/t-BuPA etchant solution with metallic copper and zinc was conducted in three solvents: scCO2 (supercrical CO2); hexanes; CD2Cl2. The etchant solution/metallic zinc reaction produced a diamagnetic Zn(II) complex, which allowed NMR identification of the t-BuPA decomposition products as tert-butyl alcohol and acetic acid. Gravimetric analysis of the amount of zinc consumed, together with NMR studies, confirmed the 1:1:2 Zn:t-BuPA:hfacH reaction stoichiometry, showing t-BuPA to be an overall two-electron oxidant for Zn(0). The metal-containing products of the copper and zinc reactions were characterized by elemental analysis, IR spectroscopy, and, as appropriate, NMR spectroscopy and single-crystal X-ray diffraction [trans-M(hfac) 2-(H2O)(CH3CO2H) (1, M = Cu; 2, M = Zn)]. On the basis of the experimental results, a working model of the oxidative dissolution reaction is proposed, which delineates the key chemical variables in the etching reaction. These t-BuPA/hfacH etchant solutions may find application in a CO2-based chemical mechanical planarization (CMP) process.

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